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Appl. Phys. Lett. 91, 132906 (2007); doi:10.1063/1.2790075 (3 pages)

Ab initio study on intrinsic defect properties of germanium nitride considered for gate dielectric

M. Yang1, S. J. Wang2, G. W. Peng1, R. Q. Wu1, and Y. P. Feng1

1Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117542, Singapore
2Institute of Materials Research and Engineering, 3 Research Link, Singapore 117602, Singapore

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(Received 31 July 2007; accepted 6 September 2007; published online 25 September 2007)

First-principles calculations based on density-functional theory and local-density approximation were carried out to investigate intrinsic defect properties in β-Ge3N4. It was found that nitrogen vacancies are the main source of intrinsic defects in Ge3N4 due to their low formation energy. The N vacancies might become charge trapping centers since they induce energy levels near the Ge conduction band edge and in the middle of the Ge3N4 band gap. The formation energy of intrinsic defects in Ge3N4 is sensitive to N chemical potential, and N-rich ambient is favorable to reduce the concentration of N vacancies.

© 2007 American Institute of Physics

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KEYWORDS and PACS

PACS

  • 71.55.Ht

    Other nonmetals

  • 71.20.Ps

    Other inorganic compounds

  • 71.15.Mb

    Density functional theory, local density approximation, gradient and other corrections

  • 61.72.J-

    Point defects and defect clusters

  • 65.40.G-

    Other thermodynamical quantities

PUBLICATION DATA

ISSN:

0003-6951 (print)  
1077-3118 (online)

For access to fully linked references, you need to log in.
    J. Robertson, Rep. Prog. Phys. 69, 327 (2006)APPLAB000085000019004418000001.

    G. D. Wilk, R. M. Wallace, and J. M. Anthony, J. Appl. Phys. 89, 5243 (2001)JAPIAU000089000010005243000001.

    I. Chambouleyron and A. R. Zanatta, J. Appl. Phys. 84, 1 (1998)JAPIAU000084000001000001000001.

    S. J. Wang, J. W. Chai, and J. S. Pan, Appl. Phys. Lett. 89, 022105 (2006)APPLAB000089000002022105000001.

    T. Maeda, T. Yasuda, M. Nishizawa, N. Miyata, Y. Morita, and S. Takagi, Appl. Phys. Lett. 85, 3181 (2004)APPLAB000085000015003181000001.

    E. Martinez, O. Renault, L. Fourdrinier, L. Clavelier, C. L. Royer, C. Licitra, T. Veyron, J. M. Hartmann, V. Loup, and L. Vandroux, Appl. Phys. Lett. 90, 053508 (2007)APPLAB000090000005053508000001.

    V. V. Afanas'ev, Y. G. Fedorenko, and A. Stesmans, Appl. Phys. Lett. 87, 032107 (2005)APPLAB000087000003032107000001.

    H. Kim, P. C. Mclntyre, C. O. Chui, K. C. Saraswat, and M. Cho, Appl. Phys. Lett. 85, 2092 (2004)APPLAB000085000011002092000001.

    J. R. Chavez, R. A. B. Devine, and L. Koltunski, J. Appl. Phys. 90, 4284 (2001)JAPIAU000090000008004284000001.

    J. J. Dong, O. F. Sankey, S. D. Deb, G. Wolf, and P. F. McMillan, Phys. Rev. B 61, 11979 (2000).

    M. Yang, S. J. Wang, Y. P. Feng, G. W. Peng, and Y. Y. Sun, J. Appl. Phys. 102, 013507 (2007)JAPIAU000102000001013507000001.

    J. E. Lowther, Phys. Rev. B 62, 5 (2000).

    G. Kresse and H. Hafner, Phys. Rev. B 47, 558 (1993)
    48, 13115 (1994).

    D. Vanderbilt, Phys. Rev. B 41, 7892 (1990).

    L. N. Kantorovich, Phys. Rev. B 60, 15476 (1999).

    S. B. Zhang and J. E. Northrup, Phys. Rev. Lett. 67, 2339 (1990).

    C. G. Van de Walle and J. Neugebauer, J. Appl. Phys. 95, 3851 (2004)JAPIAU000095000008003851000001.

    A. S. Foster, F. L. Gejo, A. L. Shluger, and R. M. Nieminen, Phys. Rev. B 65, 174117 (2002).

    A. S. Foster, V. B. Sulimov, F. L. Gejo, A. L. Shluger, and R. M. Nieminen, Phys. Rev. B 64, 224108 (2001).

    M. Houssa, M. Touminen, M. Naili, V. Afanasev, A. Stesmans, S. Haukka, and M. M. Heyns, J. Appl. Phys. 87, 8615 (2000)JAPIAU000087000012008615000001;, Appl. Phys. Lett. 87, 062105 (2005)APPLAB000087000006062105000001.

    S. J. Wang, J. W. Chai, Y. F. Dong, Y. P. Feng, N. Sutanto, J. S. Pan, and A. C. H. Huan, Appl. Phys. Lett. 88, 192103 (2006)APPLAB000088000019192103000001.

    S. J. Wang, A. C. H. Huan, Y. L. Foo, J. W. Chai, J. S. Pan, Q. Li, Y. F. Dong, Y. P. Feng, and C. K. Ong, Appl. Phys. Lett. 85, 4418 (2004)APPLAB000085000019004418000001.

    X. Zhu and S. G. Louie, Phys. Rev. B 43, 14142 (1991).


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