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Appl. Phys. Lett. 92, 064106 (2008); http://dx.doi.org/10.1063/1.2841663 (3 pages)

Lateral length scales of latent image roughness as determined by off-specular neutron reflectivity

Kristopher A. Lavery1, Vivek M. Prabhu1, Eric K. Lin1, Wen-li Wu1, Sushil K. Satija2, Kwang-Woo Choi3, and Matthew Wormington4

1Polymers Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA
2Center for Neutron Research, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA
3Intel Corporation, Santa Clara, California 95054, USA
4Bede Scientific Inc., Englewood, Colorado 80112, USA

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(Received 27 September 2007; accepted 18 January 2008; published online 14 February 2008)

A combination of specular and off-specular neutron reflectometries was used to measure the buried lateral roughness of the reaction-diffusion front in a model extreme ultraviolet lithography photoresist. Compositional heterogeneities at the latent reaction-diffusion front has been proposed as a major cause of line edge roughness in photolithographic features. This work describes the experimental observation of the longitudinal and lateral compositional heterogeneities of a latent image, revealing the buried lateral length scale as well as the amplitude of inhomogeneity at the reaction-diffusion front. These measurements aid in determining the origins of line edge roughness formation, while exploring the material limits of the current chemically amplified photoresists.

© 2008 American Institute of Physics

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KEYWORDS and PACS

PACS

  • 81.05.Lg

    Polymers and plastics; rubber; synthetic and natural fibers; organometallic and organic materials

  • 85.40.Hp

    Lithography, masks and pattern transfer

ARTICLE DATA

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

For access to fully linked references, you need to log in.
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