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Appl. Phys. Lett. 96, 092109 (2010); http://dx.doi.org/10.1063/1.3340898 (3 pages)

Electronic properties of ultrananocrystalline diamond surfaces

Simon Q. Lud1, Martin Niedermeier1, Philipp S. Koch1, Paola Bruno2, Dieter M. Gruen2, Martin Stutzmann1, and Jose A. Garrido1

1Walter Schottky Institut, Technische Universität München, Am Coulombwall 3, 85748 Garching, Germany
2Department of Materials Science, Argonne National Laboratory, Argonne, Illinois 60439, USA

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(Received 19 August 2009; accepted 8 February 2010; published online 4 March 2010)

We have characterized ultrananocrystalline diamond films with different surface terminations by x-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), scanning tunneling microscopy (STM) and scanning tunneling spectroscopy (STS). The surface terminations were performed by plasma functionalization in atmospheres of hydrogen, fluorine, and oxygen. XPS proves the dense monolayer coverage of the surface functionalization. AFM and STM show low impact of the plasma treatment on the surface morphology. STS has been used to investigate the surface electronic properties, for H-terminated surfaces the electronic structure is dominated by the sp3 carbon phase of the grain surfaces; for O- and F-terminated surfaces, however, sp2 carbon from the grain boundaries seems to determine the surface band gap.

© 2010 American Institute of Physics

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0003-6951 (print)  
1077-3118 (online)

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