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Appl. Phys. Lett. 100, 041906 (2012); http://dx.doi.org/10.1063/1.3679611 (3 pages)

Growth sector dependence and mechanism of stress formation in epitaxial diamond growth

M. Fischer1, S. Gsell1, M. Schreck1, and A. Bergmaier2

1Universität Augsburg, Institut für Physik, D-86135 Augsburg, Germany
2Universität der Bundeswehr, Institut für Angewandte Physik und Messtechnik LRT2, D-85577 Neubiberg, Germany

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(Received 14 October 2011; accepted 9 January 2012; published online 26 January 2012)

Stress generation in epitaxial diamond growth was investigated by μ-Raman spectroscopy and high resolution x-ray diffraction. Intrinsic stress could be varied systematically from compressive to tensile covering a huge range of 5 GPa. The temperature-stress curve for growth on {111}-sectors as compared to {001} shows a shift of −200 °C or +2 GPa. A crucial role of hydrogen in the stress formation process is excluded. Due to the absence of grain boundaries, a model is proposed which is based on the “effective climb” of individual dislocations. The controlled generation of stress profiles offers a powerful concept for strengthening diamond mechanical devices.

© 2012 American Institute of Physics

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KEYWORDS, PACS, and IPC

PACS

  • 68.55.aj

    Insulators

  • 78.30.Na

    Fullerenes and related materials

  • 78.66.Tr

    Fullerenes and related materials

  • 81.15.Gh

    Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)

  • 81.40.Lm

    Deformation, plasticity, and creep

  • 62.20.fg

    Shape-memory effect; yield stress; superelasticity

International Patent Classification (IPC)

  • C23C16/00

    Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

  • C30B25/00

    Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth

ARTICLE DATA

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

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