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23 Jan 2012

Volume 100, Issue 4, Articles (04xxxx)

Issue Cover Spotlight Figure

Appl. Phys. Lett. 100, 041101 (2012); http://dx.doi.org/10.1063/1.3675885 (4 pages)

Seung Ho Choi and Young L. Kim
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Experimental studies of complex hydride YMn2H6 on formation kinetics and x-ray absorption fine structure analyses

Motoaki Matsuo, Daiju Matsumura, Yasuo Nishihata, Guanqiao Li, Nao Hiyama, Satoshi Semboshi, and Shin-ichi Orimo

Appl. Phys. Lett. 100, 044101 (2012); http://dx.doi.org/10.1063/1.3678032 (3 pages) | Cited 2 times

Online Publication Date: 24 January 2012

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Formation kinetics of a complex hydride YMn2H6 with [MnH6]5− complex anion from a metal hydride YMn2H4.5 was investigated in the temperature range between 373 K and 448 K under 25 MPa H2. The time dependent of the YMn2H6 formation fraction suggested that the formation kinetics are controlled by random nucleation and growth with the activation energy of 113 kJ/mol H2. Local structure of YMn2H6 synthesized was also studied by x-ray absorption fine structure analysis. Mn–H covalent bonding nature in [MnH6]5− complex anion was successfully detected and the Mn–H distance was determined to be 1.67 ± 0.05 Å.
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78.70.Dm X-ray absorption spectra
82.40.-g Chemical kinetics and reactions: special regimes and techniques

Electron energy distribution function and plasma parameters across magnetic filters

A. Aanesland, J. Bredin, P. Chabert, and V. Godyak

Appl. Phys. Lett. 100, 044102 (2012); http://dx.doi.org/10.1063/1.3680088 (3 pages) | Cited 3 times

Online Publication Date: 24 January 2012

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The electron energy distribution function (EEDF) is measured across a magnetic filter in inductively coupled plasmas. The measured EEDFs are found to be Maxwellian in the elastic energy range with the corresponding electron temperature monotonously decreasing along the positive gradient of the magnetic field. At the maximum of the magnetic field, the electron temperature reaches its minimum and remains nearly constant in the area of the negative gradient of the field, where the plasma density distribution exhibits a local minimum.
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52.25.Fi Transport properties
52.70.Ds Electric and magnetic measurements

Efficient second harmonic generation in a metamaterial with two resonant modes coupled through two varactor diodes

Toshihiro Nakanishi, Yasuhiro Tamayama, and Masao Kitano

Appl. Phys. Lett. 100, 044103 (2012); http://dx.doi.org/10.1063/1.3679652 (3 pages) | Cited 1 time

Online Publication Date: 26 January 2012

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We present an effective method to generate second harmonic (SH) waves using nonlinear metamaterial composed of coupled split ring resonators (CSRRs) with varactor (variable capacitance) diodes. The CSRR structure has two resonant modes: a symmetric mode that resonates at the fundamental frequency and an anti-symmetric mode that resonates at the SH frequency. Resonant fundamental waves in the symmetric mode generate resonant SH waves in the anti-symmetric mode. The double resonance contributes to effective SH radiation. In the experiment, we observe 19.6 dB enhancement in the SH radiation in comparison with the nonlinear metamaterial that resonates only for the fundamental waves.
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43.25.-x Nonlinear acoustics
84.32.Tt Capacitors
41.20.-q Applied classical electromagnetism
42.65.Ky Frequency conversion; harmonic generation, including higher-order harmonic generation
42.70.-a Optical materials

Negative differential thermal conductance through vacuum

Linxiao Zhu, Clayton R. Otey, and Shanhui Fan

Appl. Phys. Lett. 100, 044104 (2012); http://dx.doi.org/10.1063/1.3679694 (3 pages) | Cited 6 times

Online Publication Date: 26 January 2012

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We propose a scheme for achieving negative differential thermal conductance in near-field electromagnetic thermal transfer. As an example, we show that the scheme can be implemented with two slabs of silicon carbide brought in close proximity to each other. We also describe how a bistable thermal switch can be constructed in this manner.
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66.70.Df Metals, alloys, and semiconductors

Decreasing high ion energy during transition in pulsed inductively coupled plasmas

Ankur Agarwal, Phillip J. Stout, Samer Banna, Shahid Rauf, and Ken Collins

Appl. Phys. Lett. 100, 044105 (2012); http://dx.doi.org/10.1063/1.3679075 (4 pages) | Cited 3 times

Online Publication Date: 27 January 2012

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Pulsed RF plasmas sustained in electronegative gas mixtures are increasingly being employed for plasma etching at future technological nodes. During the plasma transition from the afterglow to the active-glow, ion energies at the wafer can substantially increase due to the high voltage required to deposit bias power into few electrons. These high energy ions, albeit few, increase the possibility of ion bombardment damage and are, therefore, detrimental to the etching process. Strategies to decrease the high ion energies during transition are investigated using a two-dimensional computational plasma model. Results for poly-Si etch in an Ar/Cl2 gas mixture indicate that the high ion energies can be reduced by offsetting the bias pulse from the source pulse with minimal impact on the etch depth rates.
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52.77.Bn Etching and cleaning
52.80.Hc Glow; corona
81.65.Cf Surface cleaning, etching, patterning
52.25.Fi Transport properties
52.50.Dg Plasma sources
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