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30 Jan 2012

Volume 100, Issue 5, Articles (05xxxx)

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Appl. Phys. Lett. 100, 053101 (2012); http://dx.doi.org/10.1063/1.3679127 (3 pages)

Shinya Kano, Yasuyuki Yamada, Kentaro Tanaka, and Yutaka Majima
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Functional plasma polymers deposited in capacitively and inductively coupled plasmas

Dirk Hegemann, Enrico Körner, Shang Chen, Jan Benedikt, and Achim von Keudell

Appl. Phys. Lett. 100, 051601 (2012); http://dx.doi.org/10.1063/1.3681382 (3 pages) | Cited 1 time

Online Publication Date: 1 February 2012

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Capacitively and inductively coupled plasmas were investigated in order to deposit functional plasma polymers. Considering plasma chemical and surface processes, comparable films can be obtained with both plasma sources yielding distinctly higher deposition rates for ICP. While the gas phase processes scaled with the energy input into the plasma, the surface processes were controlled by the energy dissipated during film growth (ion bombardment).
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52.77.Dq Plasma-based ion implantation and deposition
61.80.Jh Ion radiation effects
82.35.-x Polymers: properties; reactions; polymerization
52.50.Dg Plasma sources

Cation stoichiometry optimization of SrTiO3 (110) thin films with atomic precision in homogeneous molecular beam epitaxy

Zhiming Wang, Jiagui Feng, Yang Yang, Yuan Yao, Lin Gu, Fang Yang, Qinlin Guo, and Jiandong Guo

Appl. Phys. Lett. 100, 051602 (2012); http://dx.doi.org/10.1063/1.3681796 (3 pages) | Cited 3 times

Online Publication Date: 2 February 2012

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We study the evolution of surface reconstructions on SrTiO3 (110) determined by cation concentration ratio and find it detectable by high energy electron diffraction (RHEED) even at high temperature up to 800 °C. The evaporation rate of Sr and Ti sources can be calibrated precisely by monitoring RHEED patterns in situ and in real time during the extended homogeneous oxide molecule beam epitaxy growth of SrTiO3 (110) film. High quality film is obtained with deviation of cation stoichiometry less than 0.5%.
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61.05.jh Low-energy electron diffraction (LEED) and reflection high-energy electron diffraction (RHEED)
68.35.bt Other materials
79.60.Dp Adsorbed layers and thin films
81.15.Hi Molecular, atomic, ion, and chemical beam epitaxy
68.47.Gh Oxide surfaces
68.37.Ef Scanning tunneling microscopy (including chemistry induced with STM)
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