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Applied Physics Letters / Volume 100 / Issue 6 / PHOTONICS AND OPTOELECTRONICS

Appl. Phys. Lett. 100, 061118 (2012); http://dx.doi.org/10.1063/1.3684242 (4 pages)

Optimizing conversion efficiency and reducing ion energy in a laser-produced Gd plasma

Thomas Cummins1, Takamitsu Otsuka2, Noboru Yugami2,3, Weihua Jiang4, Akira Endo5, Bowen Li1, Colm O’Gorman1, Padraig Dunne1, Emma Sokell1, Gerry O’Sullivan1, and Takeshi Higashiguchi2,3

1School of Physics, University College Dublin, Belfield, Dublin 4, Ireland
2Department of Advanced Interdisciplinary Sciences, Center for Optical Research and Education (CORE), and Optical Technology Innovation Center (OpTIC), Utsunomiya University, Yoto 7-1-2, Utsunomiya, Tochigi 321-8585, Japan
3Japan Science and Technology Agency, CREST, 4-1-8 Honcho, Kanagawa, Saitama 332-0012, Japan
4Department of Electrical Engineering, Nagaoka University of Technology, Kami-tomiokamachi 1603-1, Nagaoka, Niigata 940-2188, Japan
5Research Institute for Science and Engineering, Waseda University, Okubo 3-4-1, Shinjuku, Tokyo 169-8555, Japan

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(Received 16 November 2011; accepted 24 January 2012; published online 9 February 2012)

We have demonstrated an efficient extreme ultraviolet (EUV) source at 6.7 nm by irradiating Gd targets with 0.8 and 1.06 μm laser pulses of 140 fs to 10 ns duration. Maximum conversion efficiency of 0.4% was observed within a 0.6% bandwidth. A Faraday cup observed ion yield and time of flight signals for ions from plasmas generated by each laser. Ion kinetic energy was lower for shorter pulse durations, which yielded higher electron temperatures required for efficient EUV emission, due to higher laser intensity. Picosecond laser pulses were found to be the best suited to 6.7 nm EUV source generation.

© 2012 American Institute of Physics

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KEYWORDS, PACS, and IPC

Keywords

gadolinium, plasma kinetic theory, plasma light propagation, plasma production by laser, spectroscopic light sources

PACS

  • 52.50.Jm

    Plasma production and heating by laser beams (laser-foil, laser-cluster, etc.)

  • 52.25.Os

    Emission, absorption, and scattering of electromagnetic radiation

  • 52.25.Dg

    Plasma kinetic equations

  • 52.80.Yr

    Discharges for spectral sources (including inductively coupled plasma)

International Patent Classification (IPC)

  • H05H1/46

    Using applied electromagnetic fields, e.g. high frequency or microwave energy

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.3684242

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

For access to fully linked references, you need to log in.
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