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15 Jul 1981

Volume 39, Issue 2, pp. 129-183

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Erratum: Effects of inert gas dilution of silane on plasma‐deposited a‐Si:H films

J. C. Knights, R. A. Lujan, M. P. Rosenblum, R. A. Street, D. K. Biegelsen, and J. A. Reimer

Appl. Phys. Lett. 39, 183 (1981); http://dx.doi.org/10.1063/1.92883 (1 page)

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Abstract Unavailable
Show PACS
68.55.-a Thin film structure and morphology
61.43.Fs Glasses
61.43.-j Disordered solids
68.37.-d Microscopy of surfaces, interfaces, and thin films
82.30.Fi Ion-molecule, ion-ion, and charge-transfer reactions
99.10.Cd Errata
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