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27 Jun 1988

Volume 52, Issue 26, pp. 2203-2269

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Response to ‘‘Comment on ‘Evidence for Si diffusion through epitaxial NiSi2 grown on Si(111)’ ’’ [Appl. Phys. Lett. 52, 2269 (1988)]

V. Hinkel, L. Sorba, H. Haak, K. Horn, and W. Braun

Appl. Phys. Lett. 52, 2269 (1988); http://dx.doi.org/10.1063/1.99773 (1 page) | Cited 1 time

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Abstract Unavailable
Show PACS
68.35.Fx Diffusion; interface formation
81.15.-z Methods of deposition of films and coatings; film growth and epitaxy
66.30.Fq Self-diffusion in metals, semimetals, and alloys
68.65.-k Low-dimensional, mesoscopic, nanoscale and other related systems: structure and nonelectronic properties
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