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19 Jan 1998

Volume 72, Issue 3, pp. 269-391

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Characterization of the negative ion fraction in high-density SF6 magnetoplasmas using ion acoustic waves

L. St-Onge, J. Margot, and M. Chaker

Appl. Phys. Lett. 72, 290 (1998); http://dx.doi.org/10.1063/1.120715 (3 pages) | Cited 14 times

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Most plasmas used in the microelectronics industry are electronegative, i.e., they contain a large number of negative ions. One simple way to characterize the negative-to-positive ion density ratio (n−/n+) in such plasmas is to measure the velocity of ion acoustic waves (IAWs). In this letter, a detailed study of the propagation of IAWs in high-density SF6 magnetoplasmas is given. Results (n−/n+) obtained by way of this technique as functions of different parameters (gas pressure, SF6 content in SF6/Ar mixture, and radial position in the reactor) are compared to those obtained with a more sophisticated technique based on laser photodetachment. © 1998 American Institute of Physics.
Show PACS
52.35.Fp Electrostatic waves and oscillations (e.g., ion-acoustic waves)
52.27.Jt Nonneutral plasmas
52.25.-b Plasma properties
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