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15 Mar 1999

Volume 74, Issue 11, pp. 1507-1635

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Effect of initial plasma geometry and temperature on dynamic plume expansion in dual-laser ablation

Pritish Mukherjee, Shudong Chen, and Sarath Witanachchi

Appl. Phys. Lett. 74, 1546 (1999); http://dx.doi.org/10.1063/1.123611 (3 pages) | Cited 13 times

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Recent experiments have revealed the capability of large-area, uniform film growth using dual-laser ablation. The mechanism of this dynamic plume expansion is investigated in this letter. We report the critical role played by the initial geometry and temperature of the plasma in the subsequent expansion under dual-laser ablation. Initial plasma dimensions in the dual-laser ablation of ZnO are quantified by gated intensified charge-coupled detector-array imaging and combined with a hydrodynamic theoretical expansion model to yield radial thickness profiles for the deposited films. Comparisons with ellipsometric film thickness profiles indicate that the primary factors responsible for increased expansion of the dual-laser ablated plume are an extension of the initial plasma dimension in the axial direction as well as enhanced plasma temperature. © 1999 American Institute of Physics.
Show PACS
81.05.Dz II-VI semiconductors
81.15.Fg Pulsed laser ablation deposition
52.50.Jm Plasma production and heating by laser beams (laser-foil, laser-cluster, etc.)
52.25.-b Plasma properties
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