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10 May 1999

Volume 74, Issue 19, pp. 2737-2895

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Electron energy distribution function and plasma potential in a planar inductive argon discharge without electrostatic screen

Sang-Hun Seo, Jung-In Hong, and Hong-Young Chang

Appl. Phys. Lett. 74, 2776 (1999); http://dx.doi.org/10.1063/1.124010 (3 pages) | Cited 23 times

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Studies on electron heating are done during the power coupling change in the discharge mode transition (E–H mode transition) in a planar inductive argon discharge without electrostatic screen (Faraday shield). The electron energy distribution function (EEDF) evolution is measured by the alternating current superposition method with a radio frequency (rf) compensated Langmuir probe. The trend of its integrals, electron density and effective electron temperature, and especially the plasma potential against rf power are presented. It is demonstrated that the plasma potential is governed primarily by the high-energy electron tail in a plasma with bi-Maxwellian EEDF. The interdependence of the EEDF and the plasma potential is discussed. The experimental results show that the plasma potential against rf power reflects a change in the relative contribution of capacitive power coupling to electron heating. © 1999 American Institute of Physics.
Show PACS
52.50.Gj Plasma heating by particle beams
52.50.Dg Plasma sources
52.80.Pi High-frequency and RF discharges
52.70.Ds Electric and magnetic measurements

Generation of pure, high-density metal-vapor plasma by capillary discharge

S. V. Kukhlevsky, Cs. Vér, J. Kaiser, L. Kozma, L. Palladino, A. Reale, G. Tomassetti, F. Flora, and G. Giordano

Appl. Phys. Lett. 74, 2779 (1999); http://dx.doi.org/10.1063/1.124011 (3 pages) | Cited 4 times

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Generation of pure, metal-vapor plasmas with peak densities above 1019 cm−3 is reported. The plasma production is based on the explosive ablation of electrode material in the capillary μs discharge. The plasma density is controlled by varying the discharge parameters. High purity and density were achieved by optimizing the electrode configuration, the capillary material, and dimensions. © 1999 American Institute of Physics.
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52.50.Dg Plasma sources
52.80.Qj Explosions; exploding wires
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