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28 Jun 1999

Volume 74, Issue 26, pp. 3921-4070

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Erratum: “Distributed Bragg reflectors based on AlN/GaN multilayers” [Appl. Phys. Lett. 74, 1036 (1999)]

H. M. Ng, D. Doppalapudi, E. Iliopoulos, and T. D. Moustakas

Appl. Phys. Lett. 74, 4070 (1999); http://dx.doi.org/10.1063/1.123264 (1 page) | Cited 1 time

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Abstract Unavailable
Show PACS
42.79.Wc Optical coatings
42.79.Bh Lenses, prisms and mirrors
78.66.Fd III-V semiconductors
78.40.Fy Semiconductors
81.15.Hi Molecular, atomic, ion, and chemical beam epitaxy
42.86.+b Optical workshop techniques
52.77.Bn Etching and cleaning
52.77.Dq Plasma-based ion implantation and deposition
81.05.Ea III-V semiconductors
99.10.Cd Errata
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Erratum: “High-speed force sensor for force microscopy and profilometry utilizing a quartz tuning fork” [Appl. Phys. Lett. 73, 3956 (1998)]

Franz J. Giessibl

Appl. Phys. Lett. 74, 4070 (1999); http://dx.doi.org/10.1063/1.123265 (1 page)

Full Text: Read Online (HTML) | Download PDF

Abstract Unavailable
Show PACS
07.10.Pz Instruments for strain, force, and torque
07.07.Df Sensors (chemical, optical, electrical, movement, gas, etc.); remote sensing
07.79.Lh Atomic force microscopes
06.30.Bp Spatial dimensions (e.g., position, lengths, volume, angles, and displacements)
06.60.Jn High-speed techniques (microsecond to femtosecond)
77.65.Fs Electromechanical resonance; quartz resonators
99.10.Cd Errata
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