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18 Jan 1999

Volume 74, Issue 3, pp. 329-478

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Erratum: “Microscopic characterization of hot-electron spreading and trapping in SiO₂ films using ballistic electron emission microscopy” [Appl. Phys. Lett. 73, 1871 (1998)]

B. Kaczer, H.-J. Im, J. P. Pelz, and R. M. Wallace

Appl. Phys. Lett. 74, 478 (1999); http://dx.doi.org/10.1063/1.123041 (1 page)

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73.61.Ng	Insulators
73.50.Fq	High-field and nonlinear effects
99.10.Cd	Errata

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18 Jan 1999

Volume 74, Issue 3, pp. 329-478

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