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15 Feb 1999

Volume 74, Issue 7, pp. 899-1050

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Diagnostics of laser ablated plasmas using fast photography

A. Misra, A. Mitra, and R. K. Thareja

Appl. Phys. Lett. 74, 929 (1999); http://dx.doi.org/10.1063/1.123412 (3 pages) | Cited 24 times

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We report on dynamics of the laser ablated plumes in an ambient atmosphere using fast photography. The expanding plasma is studied at different delay times with respect to the ablating pulse. Dependence of plasma parameters such as velocity, temperature, density, and pressure on time and ambient atmosphere is presented. The images of the expanding plume are used to estimate the size of the particles in the plume. © 1999 American Institute of Physics.
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52.70.Kz Optical (ultraviolet, visible, infrared) measurements
52.50.Jm Plasma production and heating by laser beams (laser-foil, laser-cluster, etc.)
07.68.+m Photography, photographic instruments; xerography

Charging damage during residual metal overetching

Gyeong S. Hwang and Konstantinos P. Giapis

Appl. Phys. Lett. 74, 932 (1999); http://dx.doi.org/10.1063/1.123413 (3 pages) | Cited 6 times

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The influence of electron and ion temperatures on charging damage during residual metal (latent antenna) overetching in high-density plasmas is investigated by Monte Carlo simulations. The tunneling current through a thin gate oxide, electrically connected to the antenna, increases significantly with electron temperature, mainly as a result of changes in plasma current and ion energy distribution. However, the current decreases with ion temperature as ion shading: (a) directly decreases the ion flux to the antenna and (b) neutralizes the negative charge at the upper mask sidewalls, thus allowing more electrons to enter the pattern. The role of exposed antenna areas (trench bottoms and perimeter) is examined from the perspective of current imbalance. © 1999 American Institute of Physics.
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85.40.Ls Metallization, contacts, interconnects; device isolation
52.77.Bn Etching and cleaning
52.77.Dq Plasma-based ion implantation and deposition
81.65.Cf Surface cleaning, etching, patterning
52.40.Fd Plasma interactions with antennas; plasma-filled waveguides
52.25.Fi Transport properties
52.65.Pp Monte Carlo methods
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