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27 Sep 1999

Volume 75, Issue 13, pp. 1821-1987

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The interplay of sputtering and oxidation during plasma diffusion treatment

S. Parascandola, O. Kruse, and W. Möller

Appl. Phys. Lett. 75, 1851 (1999); http://dx.doi.org/10.1063/1.124849 (3 pages) | Cited 32 times

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Show Abstract
Metals that form dense native surface oxide layers challenge plasma diffusion treatment techniques. Experimental results obtained during nitriding of stainless steel from real-time depth-resolved compositional analysis by elastic recoil detection give insight into the transport kinetics. In agreement with semiquantitative considerations on the oxide removal and the oxide growth, the interplay of sputtering and oxidation emerges as a key parameter. On this background, suggestions for practical applications and optimization of the modification processes are given for different plasma diffusion treatment techniques. © 1999 American Institute of Physics.
Show PACS
81.65.Lp Surface hardening: nitridation, carburization, carbonitridation
81.05.Bx Metals, semimetals, and alloys
81.65.Mq Oxidation
52.77.Bn Etching and cleaning
52.77.Dq Plasma-based ion implantation and deposition
79.20.Rf Atomic, molecular, and ion beam impact and interactions with surfaces
82.80.Yc Rutherford backscattering (RBS), and other methods of chemical analysis
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