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11 Oct 1999

Volume 75, Issue 15, pp. 2163-2335

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Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography

H. H. Solak, D. He, W. Li, S. Singh-Gasson, F. Cerrina, B. H. Sohn, X. M. Yang, and P. Nealey

Appl. Phys. Lett. 75, 2328 (1999); http://dx.doi.org/10.1063/1.125005 (3 pages) | Cited 61 times

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Extreme ultraviolet (EUV, λ=13 nm) lithography is considered to be the most likely technology to follow ultraviolet (optical) lithography. One of the challenging aspects is the development of suitable resist materials and processes. This development requires the ability to produce high-resolution patterns. Until now, this ability has been severely limited by the lack of sources and imaging systems. We report printing of 38 nm period grating patterns by interferometric lithography technique with EUV light. A Lloyd’s Mirror interferometer was used, reflecting part of an incident beam with a mirror at grazing incidence and letting it interfere with the direct beam at the wafer plane. High-density fringes (38 nm pitch) were easily produced. Monochromatized light of 13 nm wavelength from an undulator in an electron storage ring provided the necessary temporal and spatial coherence along with sufficient intensity flux. This simple technique can be extended to sub-10 nm resolution. © 1999 American Institute of Physics.
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85.40.Hp Lithography, masks and pattern transfer
42.79.Dj Gratings

Electron field emission from diamond-like carbon films deposited by electrolysis of methanol liquid

H. Kiyota, H. Araki, H. Kobayashi, T. Shiga, K. Kitaguchi, M. Iida, H. Wang, T. Miyo, T. Takida, T. Kurosu, K. Inoue, I. Saito, M. Nishitani-Gamo, I. Sakaguchi, and T. Ando

Appl. Phys. Lett. 75, 2331 (1999); http://dx.doi.org/10.1063/1.125006 (3 pages) | Cited 27 times

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Electron field emission has been studied with diamond-like carbon (DLC) films deposited from a liquid phase. The DLC films were deposited on Si substrate by electrolysis of methanol liquid. The field emission measurements were carried out with a parallel plate configuration using the deposited DLC films on Si substrate as a cathode, and an indium tin oxide (ITO) coated glass plate as an anode. We found several bright spots on a luminescent screen mounted on the ITO anode, indicating that the electrons are emitted from the isolated emission sites on the deposited DLC film. The emission current density is more than 10−7 A/cm2 at the electric field as low as 1.2 V/μm. This result suggests that the DLC film deposited from the liquid phase has a potential advantage for field emitter applications. © 1999 American Institute of Physics.
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79.70.+q Field emission, ionization, evaporation, and desorption
81.15.Pq Electrodeposition, electroplating
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