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5 Jul 1999

Volume 75, Issue 1, pp. 1-147

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Erratum: “Suppressed diffusion of boron and carbon in carbon-rich silicon” [Appl. Phys. Lett. 73, 1682 (1998)]

H. Rücker, B. Heinemann, W. Röpke, R. Kurps, D. Krüger, G. Lippert, and H. J. Osten

Appl. Phys. Lett. 75, 147 (1999); http://dx.doi.org/10.1063/1.124301 (1 page) | Cited 1 time

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66.30.J-	Diffusion of impurities
61.72.J-	Point defects and defect clusters
61.72.uf	Ge and Si
99.10.Cd	Errata

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