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6 Mar 2000

Volume 76, Issue 10, pp. 1219-1345

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Electron energy control in an inductively coupled plasma at low pressures

Haruo Shindo, Takuya Urayama, Takashi Fujii, Yasuhiro Horiike, and Syuitsu Fujii

Appl. Phys. Lett. 76, 1246 (2000); http://dx.doi.org/10.1063/1.125998 (3 pages) | Cited 5 times

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A method of electron energy control was studied in an inductively coupled plasma that employed a multimode antenna, for high performance in device fabrication plasma processes. The electron energy was reduced by changing the azimuthal mode of a one-turn antenna from m = 0 to 2 with no notable change in electron density. Langmuir probe measurements showed that the electron energy reduction was more pronounced in the higher modes and at lower pressures. The antenna size was also a critical parameter. These results were confirmed by optical emission spectroscopy. It was found to be essential for the energy control that the distance between the induction-field reverse points is shorter than the electron free path. © 2000 American Institute of Physics.
Show PACS
52.25.-b Plasma properties
52.70.Kz Optical (ultraviolet, visible, infrared) measurements
52.70.Ds Electric and magnetic measurements
52.77.Bn Etching and cleaning
52.77.Dq Plasma-based ion implantation and deposition

Hot-electron flux observation in large-area microwave sustained plasmas

Jozef Kudela, Tibor Terebessy, and Masashi Kando

Appl. Phys. Lett. 76, 1249 (2000); http://dx.doi.org/10.1063/1.125999 (3 pages) | Cited 17 times

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Flux of hot electrons directed away from the waveguiding plasma-dielectric interface was experimentally observed in large-area microwave discharges. The energy of these electrons attains values of some 60 eV, and they are believed to be originating from the resonantly-enhanced electric field region localized near the dielectric. The phenomenon appears to play a significant role in discharge heating mechanism, which is demonstrated by plasma parameter profiles. © 2000 American Institute of Physics.
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52.80.Pi High-frequency and RF discharges
52.70.Ds Electric and magnetic measurements
52.25.Fi Transport properties
52.50.Gj Plasma heating by particle beams
52.50.Dg Plasma sources
52.40.Hf Plasma-material interactions; boundary layer effects
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