APL Nameplate
  • Volume/Page
  • Keyword
  • DOI
  • Citation
  • Advanced
   
 
 
 

Flickr Twitter iResearch App Facebook

BROWSE VOLUMES

Year Range: 
Search Issue | RSS Feeds RSS
Previous Issue Next Issue

13 Mar 2000

Volume 76, Issue 11, pp. 1353-1479

Return to All Sections
back to top
RSS Feeds

High-speed tapping mode imaging with active Q control for atomic force microscopy

T. Sulchek, R. Hsieh, J. D. Adams, G. G. Yaralioglu, S. C. Minne, C. F. Quate, J. P. Cleveland, A. Atalar, and D. M. Adderton

Appl. Phys. Lett. 76, 1473 (2000); http://dx.doi.org/10.1063/1.126071 (3 pages) | Cited 74 times

Full Text: Read Online (HTML) | Download PDF

Show Abstract
The speed of tapping mode imaging with the atomic force microscope (AFM) has been increased by over an order of magnitude. The enhanced operation is achieved by (1) increasing the instrument’s mechanical bandwidth and (2) actively controlling the cantilever’s dynamics. The instrument’s mechanical bandwidth is increased by an order of magnitude by replacing the piezotube z-axis actuator with an integrated zinc oxide (ZnO) piezoelectric cantilever. The cantilever’s dynamics are optimized for high-speed operation by actively damping the quality factor (Q) of the cantilever. Active damping allows the amplitude of the oscillating cantilever to respond to topography changes more quickly. With these two advancements, 80μm×80 μm high-speed tapping mode images have been obtained with a scan frequency of 15 Hz. This corresponds to a tip velocity of 2.4 mm/s. © 2000 American Institute of Physics.
Show PACS
07.79.Lh Atomic force microscopes
77.84.Bw Elements, oxides, nitrides, borides, carbides, chalcogenides, etc.
85.50.-n Dielectric, ferroelectric, and piezoelectric devices

Copper thin films used as transmission remoderators for slow positron beams

R. S. Brusa, W. Deng, R. Checchetto, G. P. Karwasz, and A. Zecca

Appl. Phys. Lett. 76, 1476 (2000); http://dx.doi.org/10.1063/1.126068 (3 pages) | Cited 3 times

Full Text: Read Online (HTML) | Download PDF

Show Abstract
The positron remoderation efficiency of self-supported copper films 1000–5000 Å thick was measured by a slow positron beam at impinging positron energies between 1 and 20 keV. A maximum efficiency of 11.5 (−1+3)% was found. It has been shown that copper films are easily produced. A relatively low temperature annealing (≃450 °C) is needed to remoderate positrons. These properties make them good candidate for positron beams with brightness enhancement stage in transmission geometry. © 2000 American Institute of Physics.
Show PACS
07.77.Ka Charged-particle beam sources and detectors
29.25.Bx Electron sources
41.75.Fr Electron and positron beams
29.27.Eg Beam handling; beam transport
Return to All Sections
Close

Google Calendar

ADVERTISEMENT

Go to AIP Home   © AIP Publishing LLC
close