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14 Aug 2000

Volume 77, Issue 7, pp. 921-1064

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Erratum: “Interdiffusion in NiFe/Cu/NiFe trilayers: Possible failure mechanism for magnetoelectronic devices” [Appl. Phys. Lett. 77, 358 (2000)]

W. Brückner, S. Baunack, M. Hecker, J.-I. Monch, L. van Loyen, and C. M. Schneider

Appl. Phys. Lett. 77, 1064 (2000); http://dx.doi.org/10.1063/1.1290446 (1 page)

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68.35.Fx	Diffusion; interface formation
66.30.Ny	Chemical interdiffusion; diffusion barriers
75.47.De	Giant magnetoresistance
85.70.Kh	Magnetic thin film devices: magnetic heads (magnetoresistive, inductive, etc.); domain-motion devices, etc.
99.10.Cd	Errata

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