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14 Aug 2000

Volume 77, Issue 7, pp. 921-1064

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Cluster beam microfabrication of patterns of three-dimensional nanostructured objects

E. Barborini, P. Piseri, A. Podesta’, and P. Milani

Appl. Phys. Lett. 77, 1059 (2000); http://dx.doi.org/10.1063/1.1289040 (3 pages) | Cited 25 times

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This letter describes the use of supersonic cluster beam deposition (SCBD) through a stencil mask for the fabrication of patterns of cluster-assembled objects. Using carbon cluster beams, micrometer-size pillars and tips have been produced on a variety of substrates. SCBD is characterized by high deposition rates, high lateral resolution, and low temperature processing. Nanostructured objects can be produced with high aspect ratio and controlled shapes. Micropatterning with SCBD can be of interest for applications requiring the integration of cluster-assembled structures with microelectronic or micromechanical devices. © 2000 American Institute of Physics.
Show PACS
81.07.-b Nanoscale materials and structures: fabrication and characterization
81.16.-c Methods of micro- and nanofabrication and processing
85.35.-p Nanoelectronic devices
61.46.-w Structure of nanoscale materials
81.15.Jj Ion and electron beam-assisted deposition; ion plating
07.10.Cm Micromechanical devices and systems
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