APL Nameplate
  • Volume/Page
  • Keyword
  • DOI
  • Citation
  • Advanced
   
 
 
 

Flickr Twitter iResearch App Facebook

BROWSE VOLUMES

Year Range: 
Search Issue | RSS Feeds RSS
Previous Issue Next Issue

8 Jan 2001

Volume 78, Issue 2, pp. 139-257

Return to All Sections
back to top
RSS Feeds

Magnetic-field-dependent plasma composition of a pulsed aluminum arc in an oxygen ambient

Jochen M. Schneider, André Anders, and George Yu. Yushkov

Appl. Phys. Lett. 78, 150 (2001); http://dx.doi.org/10.1063/1.1339847 (3 pages) | Cited 10 times

Full Text: Read Online (HTML) | Download PDF

Show Abstract
A variety of plasma-based deposition techniques utilize magnetic fields to affect the degree of ionization as well as for focusing and guiding of plasma beams. Here we use time-of-flight charge-to-mass spectrometry to describe the effect of a magnetic field on the plasma composition of a pulsed Al plasma stream in an ambient containing intentionally introduced oxygen as well as for high vacuum conditions typical residual gas. The plasma composition evolution was found to be strongly dependent on the magnetic field strength and can be understood by invoking two electron impact ionization routes: ionization of the intentionally introduced gas as well as ionization of the residual gas. These results are characteristic of plasma-based techniques where magnetic fields are employed in a high-vacuum ambient. In effect, the impurity incorporation during reactive thin-film growth pertains to the present findings. © 2001 American Institute of Physics.
Show PACS
52.80.Mg Arcs; sparks; lightning; atmospheric electricity
52.77.Dq Plasma-based ion implantation and deposition
52.70.Nc Particle measurements
52.30.Cv Magnetohydrodynamics (including electron magnetohydrodynamics)
82.80.Rt Time of flight mass spectrometry
34.80.Gs Molecular excitation and ionization

On the surface condition of Langmuir probes in reactive plasmas

E. Stamate and K. Ohe

Appl. Phys. Lett. 78, 153 (2001); http://dx.doi.org/10.1063/1.1338489 (3 pages) | Cited 18 times

Full Text: Read Online (HTML) | Download PDF

Show Abstract
The edge effect of a planar probe induces an elliptic-like sheath structure that acts as an electrostatic lens, which then focuses the charged particles on distinct regions of the probe surface. Positive-ion sputtering, chemical adsorption, and/or plasma deposition divide the probe surface into distinct regions with different work functions, which cause a double-hump structure (DHS) in the second derivative of the probe current. Thus, the DHS cannot be correlated with a distinct group of charged particles. © 2001 American Institute of Physics.
Show PACS
52.70.Ds Electric and magnetic measurements
52.40.Kh Plasma sheaths
34.35.+a Interactions of atoms and molecules with surfaces
Return to All Sections
Close

Google Calendar

ADVERTISEMENT

Go to AIP Home   © AIP Publishing LLC
close