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22 Jan 2001

Volume 78, Issue 4, pp. 393-559

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Silicon microdischarge devices having inverted pyramidal cathodes: Fabrication and performance of arrays

S.-J. Park, J. Chen, C. Liu, and J. G. Eden

Appl. Phys. Lett. 78, 419 (2001); http://dx.doi.org/10.1063/1.1338971 (3 pages) | Cited 43 times

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Microdischarge devices having inverted, square pyramidal cathodes as small as 50 μm×50 μm at the base and 35 μm in depth, have been fabricated in silicon and operated at gas pressures up to 1200 Torr. For the polyimide dielectric incorporated into these devices (εr = 2.9), the discharges produced exhibit high differential resistance ( ∼ 2×108 Ω in Ne), ignition voltages for a single device of ∼260–290 V, and currents typically in the μA range. Arrays as large as 10×10 have been fabricated. For an 8 μm thick polyimide dielectric layer, operating voltages as low as 200 V for a 5×5 array have been measured for 700 Torr of Ne. Array lifetimes are presently limited to several hours by the thin (1200–2000 Å) Ni anode. © 2001 American Institute of Physics.
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85.30.-z Semiconductor devices
81.05.Cy Elemental semiconductors
77.22.Jp Dielectric breakdown and space-charge effects

Experimental investigation of electron oscillation inside the filter of a vacuum arc plasma source

D. T. K. Kwok, T. Zhang, P. K. Chu, M. M. M. Bilek, A. Vizir, and I. G. Brown

Appl. Phys. Lett. 78, 422 (2001); http://dx.doi.org/10.1063/1.1342779 (3 pages) | Cited 5 times

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We report here experimental evidence of electron oscillation within the toroidal-section magnetic duct of a filtered vacuum arc plasma source. Our results clearly demonstrate that electrons can oscillate inside the duct under the combined effects of the electric and magnetic fields. In another experiment, we observe that, under the influence of the electron motion, the trajectories of the plasma ions are more or less unchanged except in the intensity when the Bilek plate is biased. Finally, our time-of-flight experiments show that the effects due to collisional scattering between plasma ions and oscillating electrons are masked by those associated with the metal plasma flow through the duct, and collisional scattering does not give rise to an increase of the mean charge state of the plasma ions. We conclude that the application of a bias voltage to the duct not only perturbs the ions but also influences the plasma electrons. Our results demonstrate that electrons at the central axis are one of the major reasons leading to improved plasma transport through the duct. © 2001 American Institute of Physics.
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52.50.Dg Plasma sources
52.35.Fp Electrostatic waves and oscillations (e.g., ion-acoustic waves)
52.80.Mg Arcs; sparks; lightning; atmospheric electricity
52.80.Vp Discharge in vacuum
52.25.Fi Transport properties
52.30.Cv Magnetohydrodynamics (including electron magnetohydrodynamics)
52.20.Fs Electron collisions
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