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Appl. Phys. Lett. 78, 712 (2001); http://dx.doi.org/10.1063/1.1337632 (3 pages)

Molecular-beam epitaxial growth and surface characterization of GaAs(311)B

Z. M. Wang, L. Däweritz, and K. H. Ploog

Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5-7, D-10117 Berlin, Germany

(Received 19 July 2000; accepted 13 November 2000)

Reflection high-energy electron diffraction (RHEED) and scanning tunneling microscopy (STM) are used to study the surface and growth of GaAs (311)B. The RHEED pattern reveals a lateral periodicity of 3.2 nm along the [01math] direction, which is confirmed in real space by STM images. Pronounced RHEED intensity oscillations during the homoepitaxial growth on GaAs(311)B were observed in a wide substrate temperature range. © 2001 American Institute of Physics.

© 2001 American Institute of Physics

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KEYWORDS and PACS

PACS

  • 81.15.Hi

    Molecular, atomic, ion, and chemical beam epitaxy

  • 68.35.B-

    Structure of clean surfaces (and surface reconstruction)

  • 61.05.jh

    Low-energy electron diffraction (LEED) and reflection high-energy electron diffraction (RHEED)

  • 68.55.A-

    Nucleation and growth

  • 68.37.Ef

    Scanning tunneling microscopy (including chemistry induced with STM)

  • 81.05.Ea

    III-V semiconductors

ARTICLE DATA

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

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