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Appl. Phys. Lett. 78, 712 (2001); http://dx.doi.org/10.1063/1.1337632 (3 pages)
Molecular-beam epitaxial growth and surface characterization of GaAs(311)B
(Received 19 July 2000; accepted 13 November 2000)
] direction, which is confirmed in real space by STM images. Pronounced RHEED intensity oscillations during the homoepitaxial growth on GaAs(311)B were observed in a wide substrate temperature range. © 2001 American Institute of Physics. © 2001 American Institute of Physics
RELATED DATABASES
KEYWORDS and PACS
Keywords
gallium arsenide, III-V semiconductors, molecular beam epitaxial growth, surface structure, reflection high energy electron diffraction, scanning tunnelling microscopy, semiconductor growth
PACS
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Molecular, atomic, ion, and chemical beam epitaxy
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Structure of clean surfaces (and surface reconstruction)
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Low-energy electron diffraction (LEED) and reflection high-energy electron diffraction (RHEED)
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Nucleation and growth
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Scanning tunneling microscopy (including chemistry induced with STM)
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III-V semiconductors
ARTICLE DATA
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