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20 Aug 2001

Volume 79, Issue 8, pp. 1073-1217

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Erratum: “Epitaxial growth of orientation‐controlled KNbO3 crystal films on MgO using KTaxNb1−xO3 intermediate layer by metalorganic chemical vapor deposition” [Appl. Phys. Lett. 78, 49 (2001)]

Atsushi Onoe, Ayako Yoshida, and Kiyofumi Chikuma

Appl. Phys. Lett. 79, 1217 (2001); http://dx.doi.org/10.1063/1.1396621 (1 page)

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Abstract Unavailable
Show PACS
81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)
42.70.Mp Nonlinear optical crystals
68.55.-a Thin film structure and morphology
78.66.Nk Insulators
78.20.Ci Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity)
68.35.B- Structure of clean surfaces (and surface reconstruction)
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