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Applied Physics Letters / Volume 80 / Issue 14 / LASERS, OPTICS, AND OPTOELECTRONICS

Appl. Phys. Lett. 80, 2442 (2002); doi:10.1063/1.1467622 (3 pages)

Optical thin films consisting of nanoscale laminated layers

Shin-ichi Zaitsu1, Takahisa Jitsuno1, Masahiro Nakatsuka1, Tatsuhiko Yamanaka1, and Shinji Motokoshi2

1Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan
2Institute for Laser Technology, 1-8-4 Utubo-honmachi, Nishi-ku, Osaka 550-0004, Japan

(Received 12 November 2001; accepted 14 February 2002)

The control of the refractive index of laminated coatings consisting of alternating stacks of nanoscale Al2O3 and TiO2 sublayers grown by atomic layer deposition has been achieved. The refractive index of the coating linearly changed from 1.870 to 2.318 as the thickness of the single TiO2 sublayer was varied from 2.0 to 39 Å while that of the single Al2O3 sublayer was kept constant at 5.5 Å. The refractive index could be varied by adjusting only the number of growth cycles of each material. This approach will have potential applications to optical multilayer coatings consisting of well-controlled extremely thin layers. © 2002 American Institute of Physics.

© 2002 American Institute of Physics

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KEYWORDS and PACS

Keywords

optical multilayers, laminates, refractive index, alumina, titanium compounds, nanostructured materials, optical filters

PACS

  • 42.70.Nq

    Other nonlinear optical materials; photorefractive and semiconductor materials

  • 78.20.Ci

    Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity)

  • 68.65.Ac

    Multilayers

  • 42.79.Wc

    Optical coatings

  • 78.66.-w

    Optical properties of specific thin films

  • 42.79.Ci

    Filters, zone plates, and polarizers

ARTICLE DATA

Permalink
http://link.aip.org/link/doi/10.1063/1.1467622

PUBLICATION DATA

ISSN:

0003-6951 (print)  
1077-3118 (online)

Publisher:

$abstract.society.value is a Member of CrossRef American Institute of Physics

For access to fully linked references, you need to log in.
    K. Kukli, J. Ihanus, M. Ritala, and M. Leskelä, Appl. Phys. Lett. 68, 3737 (1996)APPLAB000068000026003737000001.

    H. Zhang, R. Solanki, B. Roberds, G. Bai, and I. Banerjee, J. Appl. Phys. 87, 1921 (2000)JAPIAU000087000004001921000001.

    H. Kumagai, K. Toyoda, K. Kobayashi, M. Obara, and Y. Iimura, Appl. Phys. Lett. 70, 2338 (1997)APPLAB000070000018002338000001.


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