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Appl. Phys. Lett. 80, 2445 (2002); http://dx.doi.org/10.1063/1.1467697 (3 pages)

Low threshold 1.2 μm InGaAs quantum well lasers grown under low As/III ratio

T. Takeuchi1, Y.-L. Chang1, A. Tandon1, D. Bour1, S. Corzine1, R. Twist1, M. Tan1, and H.-C. Luan2

1Agilent Technologies Laboratories, 3500 Deer Creek Road, Palo Alto, CA 94304
2Agilent Technologies, 350 West Trimble Road, San Jose, CA 95131

(Received 28 November 2001; accepted 6 February 2002)

We have achieved 160 A/cm2 threshold current density of a 1.21 μm InGaAs/GaAs quantum well (QW) laser grown under a very low As/III ratio. We investigated the As/III ratio dependence on the optical quality of InGaAs QWs grown with arsine and tertiarybutylarsine (TBA). We found that TBA allows us to grow high quality InGaAs QWs under a very low As/III ratio (∼3), while a higher As/III ratio (∼10) with arsine is necessary to obtain the similar quality QWs. This high quality InGaAs QW grown under the low As/III ratio leads to the realization of high quality InGaAsN QW which should be grown under a low As/III ratio and a high N/V ratio. © 2002 American Institute of Physics.

© 2002 American Institute of Physics

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KEYWORDS and PACS

PACS

  • 42.60.By

    Design of specific laser systems

  • 81.07.St

    Quantum wells

  • 42.55.Px

    Semiconductor lasers; laser diodes

  • 78.67.De

    Quantum wells

  • 81.15.Gh

    Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)

  • 78.55.Cr

    III-V semiconductors

  • 85.35.Be

    Quantum well devices (quantum dots, quantum wires, etc.)

ARTICLE DATA

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

For access to fully linked references, you need to log in.
    C. H. Chen, C. A. Larsen, and G. B. Stringfellow, Appl. Phys. Lett. 50, 218 (1987)APPLAB000050000004000218000001.


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