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27 May 2002

Volume 80, Issue 21, pp. 3883-4065

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Ab initio calculations of the dissociative attachment resonance energies for an octafluorocyclopentene molecule with comparisons to electron attachment mass spectrometric measurements

Toshihiro Nakamura and Kunihide Tachibana

Appl. Phys. Lett. 80, 3904 (2002); http://dx.doi.org/10.1063/1.1481212 (3 pages) | Cited 1 time

Online Publication Date: 20 May 2002

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Dissociative electron attachment to an octafluorocyclopentene (c-C5F8) molecule has been investigated by means of ab initio molecular orbital calculations. Because of the antibonding character of the virtual valence orbitals, the temporary anions dissociate, producing neutral and negative radical fragments in reactive plasma. In order to identify the valence of virtual orbitals associated with the dissociative electron attachment in the calculation with the diffuse basis set, we examined the spatial distribution and antibonding characteristics of the virtual molecular orbitals. This theoretical approach reproduced experimental resonance energies of the dissociative electron attachment, which display rich resonance energy spectra as observed by electron attachment mass spectrometry. © 2002 American Institute of Physics.
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34.80.Ht Dissociation and dissociative attachment
34.80.Lx Recombination, attachment, and positronium formation
82.33.Xj Plasma reactions (including flowing afterglow and electric discharges)
31.15.A- Ab initio calculations
33.15.Fm Bond strengths, dissociation energies
52.20.-j Elementary processes in plasmas

Control and analysis of ion species in N2 inductively coupled plasma with inert gas mixing

K. H. Bai, D. S. Lee, H. Y. Chang, and H. S. Uhm

Appl. Phys. Lett. 80, 3907 (2002); http://dx.doi.org/10.1063/1.1479452 (3 pages) | Cited 15 times

Online Publication Date: 20 May 2002

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We control the ion density ratio of [N+]/[N2+] and investigate the relation between the ion ratio and the plasma parameters in inductively coupled plasma. We measure the electron energy distribution functions and the ion ratio in a N2/He,Ar,Xe mixture system as a function of mixing ratio. We can control the ion ratio from 0.002 to 1.4, and the ion ratio is a strong function of electron temperature. We can calculate the ion ratio using a simple model, and the obtained results agree well with the measured values in N2/He,Ar, but there is a large discrepancy in the N2/Xe discharge. The non-Maxwellian structure of the electron energy distribution functions may be the reason for the discrepancy. © 2002 American Institute of Physics.
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52.25.-b Plasma properties
52.70.-m Plasma diagnostic techniques and instrumentation
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