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4 Nov 2002

Volume 81, Issue 19, pp. 3519-3685

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Erratum/Apology: “Electron beam-induced carbon masking for electrodeposition on semiconductor surfaces” [Appl. Phys. Lett. 78, 2940 (2001)]

T. Djenizian, L. Santinacci, and P. Schmuki

Appl. Phys. Lett. 81, 3685 (2002); http://dx.doi.org/10.1063/1.1521253 (1 page)

Online Publication Date: 28 October 2002

Full Text: Read Online (HTML) | Download PDF

Abstract Unavailable
Show PACS
81.15.Pq Electrodeposition, electroplating
81.05.U- Carbon/carbon-based materials
82.45.Qr Electrodeposition and electrodissolution
85.40.Sz Deposition technology
81.15.-z Methods of deposition of films and coatings; film growth and epitaxy
85.40.Hp Lithography, masks and pattern transfer
99.10.Cd Errata
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“Nanoscale patterning of Si(110) surfaces by scratching through the native oxide layer using atomic force microscope” [Appl. Phys. Lett. 79, 1882 (2001)]

L. Santinacci, T. Djenizian, and P. Schmuki

Appl. Phys. Lett. 81, 3685 (2002); http://dx.doi.org/10.1063/1.1528350 (1 page)

Online Publication Date: 28 October 2002

Full Text: Read Online (HTML) | Download PDF

Abstract Unavailable
Show PACS
81.15.Pq Electrodeposition, electroplating
81.05.U- Carbon/carbon-based materials
82.45.Qr Electrodeposition and electrodissolution
85.40.Sz Deposition technology
81.15.-z Methods of deposition of films and coatings; film growth and epitaxy
85.40.Hp Lithography, masks and pattern transfer
99.10.Cd Errata
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