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13 Jan 2003

Volume 82, Issue 2, pp. 155-309

Issue Cover Spotlight Figure

Appl. Phys. Lett. 82, 266 (2003); http://dx.doi.org/10.1063/1.1535271 (3 pages)

Jan Genzer, Daniel A. Fischer, and Kirill Efimenko
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Emission of an intense electron beam from a ceramic honeycomb

M. Friedman, M. Myers, F. Hegeler, S. B. Swanekamp, J. D. Sethian, and L. Ludeking

Appl. Phys. Lett. 82, 179 (2003); http://dx.doi.org/10.1063/1.1537510 (3 pages) | Cited 11 times

Online Publication Date: 6 January 2003

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Inserting a slab of honeycomb ceramic in front of the emitting surface of a large-area cathode improves the electron beam emission uniformity, decreases the beam current rise and fall times, and maintains a more constant diode impedance. Moreover, changing the cathode material from velvet to carbon fiber achieved a more robust cathode that starts to emit at a higher electric field without a degradation in beam uniformity. In addition, an 80% reduction in the postshot diode pressure was also observed when gamma alumina was deposited on the ceramic. A possible explanation is that reabsorption and recycling of adsorbed gases takes place. © 2003 American Institute of Physics.
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79.70.+q Field emission, ionization, evaporation, and desorption
84.47.+w Vacuum tubes

Shaped electrode and lens for a uniform radio-frequency capacitive plasma

L. Sansonnens and J. Schmitt

Appl. Phys. Lett. 82, 182 (2003); http://dx.doi.org/10.1063/1.1534918 (3 pages) | Cited 35 times

Online Publication Date: 6 January 2003

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Plasma inhomogeneity caused by standing-wave effects in rf parallel plate reactors can be removed if one of the electrodes is replaced by a shaped electrode. The proposed shape is calculated using Maxwell’s equations in vacuum. In this solution, the electric field has a radially uniform vertical component, and a radial component which remains negligible for a plasma gap small compared to the quarter wavelength. Perturbations to this vacuum solution in presence of a plasma should remain small if the damping length due to dissipation in the plasma is large compared to the reactor radius and if the rf skin depth remains large compared to the plasma thickness. © 2003 American Institute of Physics.
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52.77.-j Plasma applications
52.80.Pi High-frequency and RF discharges
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