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20 Jan 2003

Volume 82, Issue 3, pp. 313-483

Issue Cover Spotlight Figure

Appl. Phys. Lett. 82, 370 (2003); http://dx.doi.org/10.1063/1.1537514 (3 pages)

Jan Schroers, Chris Veazey, and William L. Johnson
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Radio-frequency microdischarge arrays for large-area cold atmospheric plasma generation

Yoou-Bin Guo and Franklin Chau-Nan Hong

Appl. Phys. Lett. 82, 337 (2003); http://dx.doi.org/10.1063/1.1539296 (3 pages) | Cited 29 times

Online Publication Date: 15 January 2003

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By flowing gases through arrays of microhollow cathode holes, large area (12 mm in diameter) uniform and stable discharges could be generated by a rf power supply. Both the rf power and the gas flow through the cathode holes played key roles in maintaining uniform and stable discharges. The discharges could be stable for a period longer than one hour in pure helium (He) and in He containing 1% hexamethyldisiloxane (HMDSO). By using a third steel electrode biased with a pulse power supply (100 kHz, 50% duty cycle), the plasma from arrays of cathode holes could be extended to 20 mm in length. Amorphous carbon films deposited by the extended atmospheric plasma using 1% HMDSO/He reactants exhibited the same structure as those by low pressure plasma chemical vapor deposition. © 2003 American Institute of Physics.
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52.77.Dq Plasma-based ion implantation and deposition
52.80.Pi High-frequency and RF discharges
81.15.Jj Ion and electron beam-assisted deposition; ion plating

Anomalous hard x-ray emission mode in a plasma focus discharge with hydrogen-argon mixtures

Hoon Heo and Duck Kyu Park

Appl. Phys. Lett. 82, 340 (2003); http://dx.doi.org/10.1063/1.1537872 (3 pages) | Cited 5 times

Online Publication Date: 15 January 2003

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We observed an anomalous discharge mode causing explosive surface evaporation and emission of hard x rays of 10–40 keV in the regime of the lower hydrogen partial pressures of hydrogen–argon mixture in a Mather type plasma focus device of 1.5 kJ. At the anomalous mode, the x rays were emitted from only the surface of the anode without emissions from a plasma column or hot spots, accompanying with explosive evaporations of the anode surface. © 2003 American Institute of Physics.
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52.25.Os Emission, absorption, and scattering of electromagnetic radiation
52.59.Px Hard X-ray sources
52.80.Yr Discharges for spectral sources (including inductively coupled plasma)
52.80.Qj Explosions; exploding wires
07.85.Fv X- and γ-ray sources, mirrors, gratings, and detectors
52.58.Lq Z-pinches, plasma focus, and other pinch devices
52.59.Hq Dense plasma focus
52.75.-d Plasma devices
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