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3 Mar 2003

Volume 82, Issue 9, pp. 1323-1488

Issue Cover Spotlight Figure

Appl. Phys. Lett. 82, 1437 (2003); http://dx.doi.org/10.1063/1.1556958 (3 pages)

T. K. Yamada, M. M. J. Bischoff, T. Mizoguchi, and H. van Kempen
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Microwave absorption on a thin film

Herman Bosman, Y. Y. Lau, and R. M. Gilgenbach

Appl. Phys. Lett. 82, 1353 (2003); http://dx.doi.org/10.1063/1.1556969 (3 pages) | Cited 26 times

Online Publication Date: 25 February 2003

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With the use of a simple model, it is shown that a thin film of contaminant on a microwave window may absorb up to 50% of the incident power, even if the film thickness is only a small fraction of its resistive skin depth. This unexpectedly large amount of absorption is conjectured to have played a significant role in window failure. The temperature rise in a thin film is estimated. © 2003 American Institute of Physics.
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42.79.Ci Filters, zone plates, and polarizers
07.57.Hm Infrared, submillimeter wave, microwave, and radiowave sources

Current-free double-layer formation in a high-density helicon discharge

Christine Charles and Rod Boswell

Appl. Phys. Lett. 82, 1356 (2003); http://dx.doi.org/10.1063/1.1557319 (3 pages) | Cited 119 times

Online Publication Date: 25 February 2003

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A strong, current-free, electric double-layer with eΦ/kTe ∼ 3 and a thickness of less than 50 debye lengths has been experimentally observed in an expanding, high-density helicon sustained rf (13.56-MHz) discharge. The rapid potential decrease is associated with the “neck” of the vacuum vessel, where the glass source tube joins the aluminum diffusion chamber, and is only observed when the argon gas pressure is less than about 0.5 mTorr. The upstream electron temperature Te appears 25% greater than the downstream Te, and there is a density hole on the downstream edge. This experiment differs from others in that the potentials are self-consistently generated by the plasma itself, and there is no current flowing through an external circuit. The plasma electrons are heated by the rf fields in the source, provide the power to maintain the double-layer, and hence accelerate ions created in the source out into the diffusion chamber. © 2003 American Institute of Physics.
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52.25.Fi Transport properties
52.50.Dg Plasma sources
52.40.Hf Plasma-material interactions; boundary layer effects
52.30.-q Plasma dynamics and flow
82.33.Xj Plasma reactions (including flowing afterglow and electric discharges)
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