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10 Nov 2003

Volume 83, Issue 19, pp. 3855-4062

Issue Cover Spotlight Figure

Appl. Phys. Lett. 83, 3870 (2003); http://dx.doi.org/10.1063/1.1626004 (3 pages)

Soon-Hong Kwon, Han-Youl Ryu, Guk-Hyun Kim, Yong-Hee Lee, and Sung-Bock Kim
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Ultrashort electron bunches generated with high-intensity lasers: Applications to injectors and x-ray sources

S. Fritzler, K. Ta Phuoc, V. Malka, A. Rousse, and E. Lefebvre

Appl. Phys. Lett. 83, 3888 (2003); http://dx.doi.org/10.1063/1.1626016 (3 pages) | Cited 15 times

Online Publication Date: 3 November 2003

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The efficiency of the “forced laser wakefield” regime has recently been demonstrated, with the acceleration of electrons up to 200 MeV with a short pulse, 10 Hz laser [V. Malka et al., Science 298, 1596 (2002)]. Numerical simulations presented in this letter provide strong indications that the resulting electron bunches also have very short durations, less than 100 fs. All these features combine to suggest a number of interesting applications for such a source. We discuss its use as a high-energy injector for conventional accelerators, and assess the characteristics of the x-ray pulses that could be obtained via the channelling effect or Thomson scattering with this electron pulse. © 2003 American Institute of Physics.
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29.25.Bx Electron sources
52.38.Ph X-ray, γ-ray, and particle generation
29.27.Ac Beam injection and extraction
07.85.Fv X- and γ-ray sources, mirrors, gratings, and detectors
29.20.-c Accelerators
29.27.Eg Beam handling; beam transport
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