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24 Nov 2003

Volume 83, Issue 21, pp. 4279-4450

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Appl. Phys. Lett. 83, 4294 (2003); http://dx.doi.org/10.1063/1.1629140 (3 pages)

Han-Youl Ryu, Masaya Notomi, and Yong-Hee Lee
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Comparison between the ultraviolet emission from pulsed microhollow cathode discharges in xenon and argon

Isfried Petzenhauser, Leopold D. Biborosch, Uwe Ernst, Klaus Frank, and Karl H. Schoenbach

Appl. Phys. Lett. 83, 4297 (2003); http://dx.doi.org/10.1063/1.1626020 (3 pages) | Cited 9 times

Online Publication Date: 18 November 2003

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We measured the dynamic I–V characteristics and vacuum ultraviolet (VUV) emission lines of the second continuum in xenon (170 nm) and argon (130.5 nm) from pulsed microhollow cathode discharges (MHCD). For pulse lengths between 1 and 100 μs the dynamic I–V characteristics are similar in both inert gases. Only the time variation of the VUV emission line at 170 nm for xenon can be related to the dimer excited states. In argon the energy transfer between the Ar2∗ dimers and the oxygen impurity atoms is responsible for a qualitatively different time behavior of the resonance line at 130.5 nm. Consequently, the relative VUV efficiency reveals an inverse dependence on the electrical pulse lengths for the MHCD in xenon and argon, respectively. © 2003 American Institute of Physics.
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52.80.Hc Glow; corona
52.80.Yr Discharges for spectral sources (including inductively coupled plasma)
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