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21 Jul 2003

Volume 83, Issue 3, pp. 407-587

Issue Cover Spotlight Figure

Appl. Phys. Lett. 83, 575 (2003); http://dx.doi.org/10.1063/1.1594830 (3 pages)

P. Yu, M. Mustata, J. J. Turek, P. M. W. French, M. R. Melloch, and D. D. Nolte
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Friction force microscopy using silicon cantilevers covered with organic monolayers via silicon–carbon covalent bonds

Masato Ara and Hirokazu Tada

Appl. Phys. Lett. 83, 578 (2003); http://dx.doi.org/10.1063/1.1592613 (3 pages) | Cited 4 times

Online Publication Date: 16 July 2003

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Cantilevers covered with hydrocarbon (CH) and fluorocarbon (CF) monolayers via Si☒C covalent bonds were prepared and used for adhesion force measurements and friction force microscopy of the surface patterned also with CH and CF areas. The adhesion and friction forces on CF areas were larger than those on CH areas, especially using CF cantilevers. Large polarizabilities of CF molecules compared to CH molecules are found to enhance the contrast in adhesion and friction images. The cantilevers covered with organic monolayers via covalent bonds are useful for chemical force microscopy with contact and noncontact mode atomic force microscopy in various atmospheres since the interface between molecules and cantilevers is thermally and chemically stable. © 2003 American Institute of Physics.
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68.37.Ps Atomic force microscopy (AFM)
07.79.Sp Friction force microscopes
68.35.Np Adhesion
68.47.Fg Semiconductor surfaces
68.43.Fg Adsorbate structure (binding sites, geometry)
81.65.-b Surface treatments

Conductivity-based contact sensing for probe arrays in dip-pen nanolithography

Jun Zou, David Bullen, Xuefeng Wang, Chang Liu, and Chad A. Mirkin

Appl. Phys. Lett. 83, 581 (2003); http://dx.doi.org/10.1063/1.1592620 (3 pages) | Cited 6 times

Online Publication Date: 16 July 2003

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This letter reports a contact sensing method for dip-pen nanolithography which functions by monitoring the conductivity between the lithography probe and the substrate. Experimental results show that this method has high sensitivity and is suitable for dip-pen nanolithography applications with large probe arrays. © 2003 American Institute of Physics.
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81.16.Nd Micro- and nanolithography
07.79.Lh Atomic force microscopes
84.37.+q Measurements in electric variables (including voltage, current, resistance, capacitance, inductance, impedance, and admittance, etc.)
85.40.Hp Lithography, masks and pattern transfer

Propagation of the electromagnetic field in fully coated near-field optical probes

L. Vaccaro, L. Aeschimann, U. Staufer, H. P. Herzig, and R. Dändliker

Appl. Phys. Lett. 83, 584 (2003); http://dx.doi.org/10.1063/1.1594288 (3 pages) | Cited 20 times

Online Publication Date: 16 July 2003

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Fully metal-coated near-field optical probes, based on a cantilever design, have been studied theoretically and experimentally. Numerical simulations prove that these structures allow nonzero modal emission of the electromagnetic field through a 60-nm-thick metallic layer, that is opaque when deposited on flat substrates. The far-field intensity patterns recorded experimentally correspond to the ones calculated for the fundamental and first excited LP modes. Moreover, this study demonstrates that a high confinement of the electromagnetic energy can be reached in the near-field, when illuminated with radially polarized light. Finally, it was verified that the confinement of the field depends on the volume of the probe apex. © 2003 American Institute of Physics.
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07.79.Fc Near-field scanning optical microscopes
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