The use of silicon oxy-nitride (SiOxNy) as an anode buffer layer in organic light-emitting devices (OLEDs) with a configuration of indium tin oxide (ITO)/SiOxNy/α-naphtylphenyliphenyl diamine (NPB)/8-hydroxyquinoline aluminum/Mg:Ag has been studied. With a SiOxNy buffer layer several angstroms thick, the device efficiency increased from 3.0 to 3.8 cd/A. The buffer layer also protected the ITO surface from contamination due to air exposure. Upon exposing the cleaned ITO substrate to air for one day before device fabrication, the device current efficiency and turn-on voltage degraded to 2.1 cd/A and 4.3 V, respectively, from 3 cd/A and 3.3 V for the device fabricated on an as-cleaned ITO surface. In contrast, devices prepared on air-exposed SiOxNy/ITO surface had almost the same current efficiency (3.85 cd/A) and turn on voltage (3.7 V) comparing to devices (3.8 cd/A and 3.7 V) fabricated on freshly prepared SiOxNy/ITO surface. The results suggested that SiOxNy is a promising anode buffer layer for OLEDs, for both efficiency and stability enhancements. © 2003 American Institute of Physics.