APL Nameplate
  • Volume/Page
  • Keyword
  • DOI
  • Citation
  • Advanced
   
 
 
 

Flickr Twitter iResearch App Facebook

BROWSE VOLUMES

Year Range: 
Search Issue | RSS Feeds RSS
Previous Issue Next Issue

29 Mar 2004

Volume 84, Issue 13, pp. 2223-2459

Issue Cover Spotlight Figure

Appl. Phys. Lett. 84, 2244 (2004); http://dx.doi.org/10.1063/1.1690471 (3 pages)

David R. Smith, David Schurig, Jack J. Mock, Pavel Kolinko, and Patrick Rye
Enlarge Image | Read More
Return to All Sections
back to top
RSS Feeds

Liquid-tin-jet laser-plasma extreme ultraviolet generation

P. A. C. Jansson, B. A. M. Hansson, O. Hemberg, M. Otendal, A. Holmberg, J. de Groot, and H. M. Hertz

Appl. Phys. Lett. 84, 2256 (2004); http://dx.doi.org/10.1063/1.1690874 (3 pages) | Cited 29 times

Online Publication Date: 23 March 2004

Full Text: Read Online (HTML) | Download PDF

Show Abstract
We demonstrate the applicability of liquid-metal jets in vacuum as regenerative targets for laser-plasma generation of extreme ultraviolet (EUV) and soft x-ray radiation. This extends the operation of liquid-jet laser-plasma sources to high-temperature, high-Z, high-density, low-vapor-pressure materials with new spectral signatures. The system is demonstrated using tin (Sn) as the target due to its strong emission around λ ≈ 13 nm, which makes the material suitable for EUV lithography. We show a conversion efficiency of 2.5% into (2%BW×2π×sr) and report quantitative measurements of the ionic/atomic as well as particulate debris emission. © 2004 American Institute of Physics.
Show PACS
52.50.Jm Plasma production and heating by laser beams (laser-foil, laser-cluster, etc.)
52.75.-d Plasma devices
07.85.Fv X- and γ-ray sources, mirrors, gratings, and detectors
52.25.Os Emission, absorption, and scattering of electromagnetic radiation
42.72.Bj Visible and ultraviolet sources
85.40.Hp Lithography, masks and pattern transfer

Dependence of hard x-ray yield on laser pulse parameters in the wavelength-cubed regime

Bixue Hou, John A. Nees, Wolfgang Theobald, Gérard A. Mourou, L. M. Chen, Jean-Claude Kieffer, Andrzej Krol, and C. C. Chamberlain

Appl. Phys. Lett. 84, 2259 (2004); http://dx.doi.org/10.1063/1.1688985 (3 pages) | Cited 18 times

Online Publication Date: 23 March 2004

Full Text: Read Online (HTML) | Download PDF

Show Abstract
Conversion efficiency and electron temperature scaling laws are experimentally studied in the wavelength-cubed (λ3) regime, where a single-wavelength focus allows low energy pulses incident on a Mo target to produce x rays with excellent efficiency and improved spatial coherence. Focused intensity is varied from 2×1016 to 2×1018 W/cm2. Conversion efficiency and electron temperature are best described by a power law for energy scaling while an exponential law best describes the scaling of these parameters with pulse duration. © 2004 American Institute of Physics.
Show PACS
52.38.Ph X-ray, γ-ray, and particle generation
52.59.Px Hard X-ray sources
61.80.Ba Ultraviolet, visible, and infrared radiation effects (including laser radiation)
78.70.En X-ray emission spectra and fluorescence
Return to All Sections
Close

Google Calendar

ADVERTISEMENT

Go to AIP Home   © AIP Publishing LLC
close