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Appl. Phys. Lett. 84, 1269 (2004); http://dx.doi.org/10.1063/1.1647272 (3 pages)

Mechanism for small electron current fraction in a vacuum arc cathode spot on a refractory cathode

I. I. Beilis

Electrical Discharge and Plasma Laboratory, Department of Interdisciplinary Studies, Fleischman Faculty of Engineering, Tel Aviv University, P.O.Box 39040, Tel Aviv 69978, Israel

(Received 7 October 2003; accepted 17 December 2003)

A mechanism for refractory cathode spot operation in a vacuum arc is proposed, based on the presence of a finite electric field Ep at the cathode sheath–plasma interface. The proposed model determines the relationship between the electron current and the total spot current density j and includes a system of equations solved for cathode plasma containing a mixture of ion states. The calculation shows that Ep reaches a value, ∼ 106 V/cm, and j is 104–108 A/cm2, when the electron current fraction s increases from 0.5 to 0.9. It is discovered that for a refractory cathode, ions with high ionicity (from 2 to 4) can be generated in the spot region for a relatively small s, 0.7–0.9, in contrast to ionization in the plasma jet, as predicted previously for copper cathodes. © 2004 American Institute of Physics.

© 2004 American Institute of Physics

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0003-6951 (print)  
1077-3118 (online)

For access to fully linked references, you need to log in.
    I. Langmuir, Phys. Rev. 33, 954 (1929).

    I. I. Beilis and M. Keidar, Phys. Plasmas 5, 1545 (1998)PHPAEN000005000005001545000001.


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