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6 Sep 2004

Volume 85, Issue 10, pp. 1659-1861

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Appl. Phys. Lett. 85, 1793 (2004); http://dx.doi.org/10.1063/1.1790588 (3 pages)

Hyunsik Yoon, Kyoung Mi Lee, Dahl-Young Khang, Hong H. Lee, and Se-Jin Choi
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Reduction of the electrostatic coupling in a large-area internal inductively coupled plasma source using a multicusp magnetic field

Y. J. Lee, K. N. Kim, G. Y. Yeom, and M. A. Lieberman

Appl. Phys. Lett. 85, 1677 (2004); http://dx.doi.org/10.1063/1.1784877 (3 pages) | Cited 5 times

Online Publication Date: 13 September 2004

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A large area (1020 mm×830 mm) inductively coupled plasma (ICP) source has been developed using an internal-type linear antenna with permanent magnets forming a multicusp magnetic field. The large rf antenna voltages, which cause the electrostatic coupling between the antenna and the plasma in a large area internal-type linear-antenna ICP source, were decreased significantly by applying the magnetic field near and parallel to the antenna. Through the application of the magnetic field, an approximately 20% higher plasma density, with a value of close to 1.0×1011 cm−3 at a rf power of 2000 W, and about three times higher photoresist etch rates were observed, while maintaining the plasma nonuniformity at less than 9%.
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52.50.Dg Plasma sources
52.40.Fd Plasma interactions with antennas; plasma-filled waveguides
52.35.Fp Electrostatic waves and oscillations (e.g., ion-acoustic waves)
52.25.-b Plasma properties
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