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Appl. Phys. Lett. 85, 2092 (2004); http://dx.doi.org/10.1063/1.1790026 (3 pages)

Enhancement of organic light-emitting device performances with Hf-doped indium tin oxide anodes

T.-H. Chen1, Y. Liou1, T. J. Wu2, and J. Y. Chen2

1Institute of Physics, Academia Sinica, Taipei, 11529 Taiwan
2ULVAC Taiwan Inc., Taipei, 11529 Taiwan

(Received 19 April 2004; accepted 6 July 2004)

We have enhanced the luminance and the power efficiency of organic light-emitting devices with Hf-doped indium tin oxide (ITO) anodes instead of a CuPc layer. The Hf-doped ITO layer with a thickness of 15 nm was deposited on top of the ITO anode. Less than 10 mol. % of Hf was doped in ITO films by adjusting the sputtering rates of both sources. The highest work function of the Hf-doped ITO layers was 5.4 eV at the Hf concentrations about 10 mol. %. The driving voltages of the device have been reduced by 1 V. A luminance of 1000 cd∕m2 at 7 mA∕cm2, a current efficiency of 14 cd∕A, and a power efficiency of 6 lm∕W at 6 mA∕cm2 have been achieved in the device with a 4 mol. % Hf-doped ITO layer (work function=5.2 eV). In general, the performance was about 50% better than the device with a CuPc buffer layer.

© 2004 American Institute of Physics

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0003-6951 (print)  
1077-3118 (online)

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