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13 Sep 2004

Volume 85, Issue 11, pp. 1871-2145

Issue Cover Spotlight Figure

Appl. Phys. Lett. 85, 1895 (2004); http://dx.doi.org/10.1063/1.1792802 (3 pages)

Markus Deubel, Martin Wegener, Artan Kaso, and Sajeev John
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Pulsed electron beam generation in a simple discharge device

M. J. Rhee and M. Strikovski

Appl. Phys. Lett. 85, 1916 (2004); http://dx.doi.org/10.1063/1.1784540 (3 pages)

Online Publication Date: 17 September 2004

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We report a phenomenon of pulsed electron beam generation in a low-pressure gas discharge device. The cathode of the device is of simple geometry without a hollow cavity that is employed in the transient hollow cathode discharge (THCD) devices. The discharge and beam characteristics are measured and found to be similar to that of THCDs such as pseudospark and channelspark.
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52.80.Mg Arcs; sparks; lightning; atmospheric electricity
52.77.-j Plasma applications

Monochromatic imaging and angular distribution measurements of extreme ultraviolet light from laser-produced Sn and SnO2 plasmas

Y. Tao, F. Sohbatzadeh, H. Nishimura, R. Matsui, T. Hibino, T. Okuno, S. Fujioka, K. Nagai, T. Norimatsu, K. Nishihara, N. Miyanaga, Y. Izawa, A. Sunahara, and T. Kawamura

Appl. Phys. Lett. 85, 1919 (2004); http://dx.doi.org/10.1063/1.1788878 (3 pages) | Cited 20 times

Online Publication Date: 17 September 2004

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Properties of extreme ultraviolet (EUV) emission from laser-produced Sn and SnO2 plasmas were investigated. EUV emission images were taken with a monochromatic imager for 13.5 nm with 4% bandwidth. It was found that the EUV emitting plasma is not formed symmetrically with respect to the target surface normal but extends toward laser incident axis. This result is consistent with the angular distribution of EUV emission peaked toward the direction nearly perpendicular to the laser axis. The asymmetric plasma can be attributed to the interaction of a long laser pulse with expanding plasma along the path of laser incidence.
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52.38.Dx Laser light absorption in plasmas (collisional, parametric, etc.)
52.50.Jm Plasma production and heating by laser beams (laser-foil, laser-cluster, etc.)
52.25.Os Emission, absorption, and scattering of electromagnetic radiation

Relation between the CF2 radical and plasma density measured using LIF and cutoff probe in a CF4 inductively coupled plasma

Jung-Hyung Kim, Yong-Hyeon Shin, Kwang-Hwa Chung, and Yong-Shim Yoo

Appl. Phys. Lett. 85, 1922 (2004); http://dx.doi.org/10.1063/1.1788880 (3 pages) | Cited 2 times

Online Publication Date: 17 September 2004

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The behavior of the CF2 radical was studied in a CF4 inductively coupled plasma. The CF2 radical was measured using a laser-induced fluorescence method. Absolute electron density was measured using a cutoff probe and the electron temperature was measured using a double probe to study the relationship between these electron properties and the CF2 radical. To examine the relationship between them, the CF2 radical and electron density were measured as a function of the rf power, which is a major external parameter influencing the electron density. As the rf power was increased, the CF2 radical density increased in the range of low electron density, and then decreased beyond a critical electron density. The dependence of the CF2 radical density on the electron density was theoretically analyzed with rate equations. The theoretical result was in good agreement with experiment.
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52.50.Jm Plasma production and heating by laser beams (laser-foil, laser-cluster, etc.)
52.70.Ds Electric and magnetic measurements
52.25.-b Plasma properties
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