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20 Dec 2004

Volume 85, Issue 25, pp. 6083-6293

Issue Cover Spotlight Figure

Appl. Phys. Lett. 85, 6281 (2004); http://dx.doi.org/10.1063/1.1834720 (3 pages)

M. P. Rao, M. F. Aimi, and N. C. MacDonald
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Mechanisms of target poisoning during magnetron sputtering as investigated by real-time in situ analysis and collisional computer simulation

D. Güttler, B. Abendroth, R. Grötzschel, W. Möller, and D. Depla

Appl. Phys. Lett. 85, 6134 (2004); http://dx.doi.org/10.1063/1.1835002 (3 pages) | Cited 17 times

Online Publication Date: 15 December 2004

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The evolution of reactive gas uptake at the target surface has been investigated by real-time in situ diagnostics during magnetron sputtering. Using a planar circular dc magnetron for reactive sputter deposition of TiN from a Ti target in an argon/nitrogen gas mixture, the target uptake of nitrogen was determined at varying gas flows of nitrogen using the 14N(d,α)12C nuclear reaction, directly demonstrating the target “poisoning” effect. The expected hysteresis behavior at increasing/decreasing nitrogen gas flow is confirmed. Within the precision of the measurement, the nitrogen content remains unaltered after switching off the magnetron, indicating the absence of a significant mobile fraction of nitrogen in the target. The maximum amount of retained nitrogen significantly exceeds one adsorbed monolayer, which is attributed to nitrogen ion implantation and recoil implantation of adsorbed nitrogen. This is quantitatively reproduced by TRIDYN collisional computer simulations.
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68.55.Ln Defects and impurities: doping, implantation, distribution, concentration, etc.
81.15.Cd Deposition by sputtering

Observation of self-sputtering in energetic condensation of metal ions

André Anders

Appl. Phys. Lett. 85, 6137 (2004); http://dx.doi.org/10.1063/1.1840115 (3 pages) | Cited 10 times

Online Publication Date: 15 December 2004

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The condensation of energetic metal ions on a surface may cause self-sputtering even in the absence of substrate bias. Charge-state-averaged self-sputtering yields were determined for both zirconium and gold ions generated by a cathodic vacuum arc. Films were deposited on differently biased substrates exposed to streaming Zr and Au vacuum arc plasma. The self-sputtering yields for both metals were estimated to be about 0.05 in the absence of bias, and exceeding 0.5 when bias reached −50 V. These surprisingly high values can be reconciled with binary collision theory and molecular dynamics calculations taking the high kinetic and potential energy of vacuum arc ions into account.
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79.20.Rf Atomic, molecular, and ion beam impact and interactions with surfaces
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