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2 Aug 2004

Volume 85, Issue 5, pp. 701-848

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Appl. Phys. Lett. 85, 807 (2004); http://dx.doi.org/10.1063/1.1777817 (3 pages)

Henry J. Liu and Kyeongjae Cho
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Synergism between low-energy neutral particles and energetic ions in the pulsed glow discharge deposition of diamond-like carbon films

I. V. Afanasyev-Charkin and M. Nastasi

Appl. Phys. Lett. 85, 718 (2004); http://dx.doi.org/10.1063/1.1775876 (3 pages) | Cited 6 times

Online Publication Date: 27 July 2004

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Diamond-like carbon films were deposited using pulsed glow discharge deposition at 4 kV. The duty factor was varied and all other parameters were kept constant. It was shown that the contribution of neutral particles to the total number of deposition atoms is much larger than that of energetic ions. At the same time, there is a relationship between the deposition of neutral particles and ion bombardment. The sticking coefficient of the neutral particles in proportional to the flux of energetic ions and does not exceed 5×10−4 for the deposition parameters used in our experiment.
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68.55.A- Nucleation and growth
81.15.Jj Ion and electron beam-assisted deposition; ion plating
52.80.Hc Glow; corona
61.80.Jh Ion radiation effects

Pulsed inductively coupled plasmas as a method to recoup uniformity: Three-dimensional modeling study

Pramod Subramonium and Mark J. Kushner

Appl. Phys. Lett. 85, 721 (2004); http://dx.doi.org/10.1063/1.1776617 (3 pages) | Cited 2 times

Online Publication Date: 27 July 2004

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High plasma density sources such as inductively plasmas (ICPs) are commonly used for microelectronics fabrication. Design constraints often result in systems which have asymmetric gas pumping which can in turn produce azimuthal nonuniformities in plasma properties. These asymmetries are reinforced by a positive feedback between nonuniformities in conductivity and power deposition. In this letter, we discuss computational results from a three-dimensional model for pulsed operation of ICPs sustained in argon as a means to recoup azimuthal symmetry of plasma properties which may result from asymmetric pumping. We found that azimuthally asymmetric plasma properties produced by continuous operation gradually become more uniform during pulsed operation due to the interruption of the positive feedback and allowing interpulse diffusion to smooth asymmetries.
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52.50.Dg Plasma sources
52.25.Fi Transport properties
52.65.-y Plasma simulation
52.77.-j Plasma applications
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