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2 May 2005

Volume 86, Issue 18, Articles (18xxxx)

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Appl. Phys. Lett. 86, 181101 (2005); http://dx.doi.org/10.1063/1.1920407 (3 pages)

Giacomo Scalari, Nicolas Hoyler, Marcella Giovannini, and Jérôme Faist
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Electronic temperature and density of the plasma produced by nanosecond ultraviolet laser ablation of LiF

F. J. Gordillo-Vázquez, A. Perea, A. P. McKiernan, and C. N. Afonso

Appl. Phys. Lett. 86, 181501 (2005); http://dx.doi.org/10.1063/1.1922574 (3 pages) | Cited 8 times

Online Publication Date: 25 April 2005

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Optical emission spectroscopy is used to investigate the spatial evolution of the electron temperature (Te) and electron density (Ne) in the plasma generated by laser ablation in a vacuum of a wide-band-gap material, such as LiF, with a pulsed 193 nm excimer laser operating at a fluence of 1.5 J cm−2 close to the threshold. It is found that, whereas Ne (in the range of 1016 cm−3) decreases by a factor of 2 as the distance to the target increases, Te exhibits a sharp decrease (from 1.85 eV to 0.66 eV) between 1 and 2 mm from the target and it remains practically constant for longer distances from the target. These results provide direct measurements of the electron temperature and density during nanosecond laser ablation of LiF.
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52.25.-b Plasma properties
52.70.Kz Optical (ultraviolet, visible, infrared) measurements
52.38.Mf Laser ablation
52.50.Jm Plasma production and heating by laser beams (laser-foil, laser-cluster, etc.)
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