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30 May 2005

Volume 86, Issue 22, Articles (22xxxx)

Issue Cover Spotlight Figure

Appl. Phys. Lett. 86, 223902 (2005); http://dx.doi.org/10.1063/1.1938253 (3 pages)

Philip J. Lee, Paul J. Hung, Robin Shaw, Lily Jan, and Luke P. Lee
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Nanoporous alumina as a dielectric for microcavity plasma devices: Multilayer Al/Al2O3 structures

S.-J. Park, K. S. Kim, and J. G. Eden

Appl. Phys. Lett. 86, 221501 (2005); http://dx.doi.org/10.1063/1.1923747 (3 pages) | Cited 24 times

Online Publication Date: 24 May 2005

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Show Abstract
Nanostructured Al2O3 films with mean pore diameters of 20 nm, 5–30 μm in thickness, and grown onto Al foil by a multiple step electrochemical process, provide a dielectric having superior properties for microplasma devices and arrays. Multilayer Al/nanoporous Al2O3 structures with a 100–300 μm diameter (dia.) cylindrical microcavity and an overall thickness of ∼ 200 μm are robust and operate in the abnormal glow mode for Ne or Ar/2–5% N2 mixture gas pressures (300 K) of 500–700 Torr. When driven with a sinusoidal ac waveform at frequencies of 5–20 kHz, small arrays (3×3→10×10) of 100 μm dia. devices operate in Ne at rms voltages and currents of ∼ 160–270 V and 0.4–4.5 mA, respectively. Arrays as large as 10×10 have been fabricated to date and generate azimuthally uniform discharges in each pixel without the need for external ballast. For an rms voltage of ∼ 275 V, 5×5 arrays of 100 μm dia. devices produce a luminance of 2700 cd m−2 in 600 Torr of Ne for a sinusoidal ac excitation frequency of 20 kHz.
Show PACS
77.84.Bw Elements, oxides, nitrides, borides, carbides, chalcogenides, etc.
77.55.-g Dielectric thin films
81.05.Rm Porous materials; granular materials
78.66.Nk Insulators
78.67.Pt Multilayers; superlattices; photonic structures; metamaterials
73.61.Ng Insulators
61.46.-w Structure of nanoscale materials
52.75.-d Plasma devices
52.80.Hc Glow; corona
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