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27 Jun 2005

Volume 86, Issue 26, Articles (26xxxx)

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Appl. Phys. Lett. 86, 263107 (2005); http://dx.doi.org/10.1063/1.1952585 (3 pages)

B. Yang, M. S. Marcus, D. G. Keppel, P. P. Zhang, Z. W. Li, B. J. Larson, D. E. Savage, J. M. Simmons, O. M. Castellini, M. A. Eriksson, and M. G. Lagally
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Complex ion-focusing effect by the sheath above the wafer in plasma immersion ion implantation

E. Stamate, N. Holtzer, and H. Sugai

Appl. Phys. Lett. 86, 261501 (2005); http://dx.doi.org/10.1063/1.1951045 (3 pages) | Cited 9 times

Online Publication Date: 20 June 2005

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The ion flux on the wafer surface during plasma immersion ion implantation is investigated by three-dimensional simulations and experiments. Due to the finite size of the wafer and its stage, the evolving sheath acts as a lens that focuses the positive ions to distinct regions on the wafer surface. Depending on the sheath profile, two focusing effects are identified. Discrete focusing involves ions entering the sheath from its frontal side and leads to the formation of a passive surface near the wafer edge, while the modal focusing affects ions entering the sheath from the lateral side of the stage and are eventually directed to the wafer center.
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81.05.Cy Elemental semiconductors
52.77.Dq Plasma-based ion implantation and deposition
79.20.Rf Atomic, molecular, and ion beam impact and interactions with surfaces
52.40.Kh Plasma sheaths
81.65.Cf Surface cleaning, etching, patterning
61.72.uf Ge and Si

Laser wavelength and spot diameter dependence of extreme ultraviolet conversion efficiency in ω, 2ω, and 3ω Nd:YAG laser-produced plasmas

Shuji Miyamoto, Atushi Shimoura, Sho Amano, Keisuke Fukugaki, Hiroaki Kinugasa, Takahiro Inoue, and Takayasu Mochizuki

Appl. Phys. Lett. 86, 261502 (2005); http://dx.doi.org/10.1063/1.1968415 (3 pages) | Cited 10 times

Online Publication Date: 21 June 2005

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Conversion efficiency and spectra of extreme ultraviolet radiations from a cryogenic planar solid xenon target were investigated as a function of laser wavelength (ω, 2ω, and 3ω Nd:YAG) and the laser focus spot size (50–700 μm) at the intensity 1010–5×1012 W/cm2. The conversion efficiency increased with laser intensity and reached the maximum value at about 1011 W/cm2 for all colors. It was found that an edge effect appears more strongly at the ω-laser case, indicating more lateral energy loss, while it appears only weakly for higher harmonics. Shorter-wavelength lasers generated significant conversion efficiencies even at lower laser energies; that is, with smaller laser spots. As the wavelength decreased from ω, 2ω, and 3ω, a spectral hump appeared in the extreme ultraviolet band around 13.5 nm region, while the spectral intensity at 10.8 nm drastically decreased. High-energy photon generation in the tail of 10.8 nm peak was found to be strongly suppressed at shorter-wavelength laser (3ω), while the conversion efficiency at 13.5 nm was as large as that at ω. This indicates that a Xe[XI] ion-rich plasma have been efficiently produced in the ablation plasma by using 3ω laser without overheating the underdense plasma responsible for extreme ultraviolet emission.
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52.50.Jm Plasma production and heating by laser beams (laser-foil, laser-cluster, etc.)
52.25.Os Emission, absorption, and scattering of electromagnetic radiation
52.38.Mf Laser ablation
52.70.Kz Optical (ultraviolet, visible, infrared) measurements
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