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Applied Physics Letters / Volume 86 / Issue 8 / NANOSCALE SCIENCE AND DESIGN

Appl. Phys. Lett. 86, 083108 (2005); doi:10.1063/1.1870122 (3 pages)

Atomic layer deposition of ZnO on ultralow-density nanoporous silica aerogel monoliths

S. O. Kucheyev1, J. Biener1, Y. M. Wang1, T. F. Baumann1, K. J. Wu1, T. van Buuren1, A. V. Hamza1, J. H. Satcher1, J. W. Elam2, and M. J. Pellin2

1Lawrence Livermore National Laboratory, Livermore, California 94550
2Argonne National Laboratory, Argonne, Illinois 60439

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(Received 10 September 2004; accepted 19 January 2005; published online 18 February 2005)

We report on atomic layer deposition of an ∼ 2-nm-thick ZnO layer on the inner surface of ultralow-density ( ∼ 0.5% of the full density) nanoporous silica aerogel monoliths with an extremely large effective aspect ratio of ∼ 105 (defined as the ratio of the monolith thickness to the average pore size). The resultant monoliths are formed by amorphous-SiO2 core/wurtzite-ZnO shell nanoparticles which are randomly oriented and interconnected into an open-cell network with an apparent density of ∼ 3% and a surface area of ∼ 100 m2 g−1. Secondary ion mass spectrometry and high-resolution transmission electron microscopy imaging reveal excellent uniformity and crystallinity of ZnO coating. Oxygen K-edge and Zn L3-edge soft x-ray absorption near-edge structure spectroscopy shows broadened O p- as well as Zn s- and d-projected densities of states in the conduction band.

© 2005 American Institute of Physics

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KEYWORDS and PACS

Keywords

zinc compounds, II-VI semiconductors, semiconductor thin films, nanoporous materials, nanoparticles, semiconductor growth, atomic layer deposition, porosity, aerogels, XANES, conduction bands, electronic density of states, secondary ion mass spectra, transmission electron microscopy

PACS

  • 81.05.Dz

    II-VI semiconductors

  • 68.55.A-

    Nucleation and growth

  • 82.70.Gg

    Gels and sols

  • 61.46.-w

    Structure of nanoscale materials

  • 61.43.Gt

    Powders, porous materials

  • 68.55.-a

    Thin film structure and morphology

  • 81.15.Gh

    Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)

  • 73.20.At

    Surface states, band structure, electron density of states

  • 79.20.Rf

    Atomic, molecular, and ion beam impact and interactions with surfaces

  • 78.70.Dm

    X-ray absorption spectra

  • 68.37.Lp

    Transmission electron microscopy (TEM)

ARTICLE DATA

Permalink
http://link.aip.org/link/doi/10.1063/1.1870122

PUBLICATION DATA

ISSN:

0003-6951 (print)  
1077-3118 (online)

Publisher:

$abstract.society.value is a Member of CrossRef American Institute of Physics

For access to fully linked references, you need to log in.
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    K. S. Hamad, R. Roth, J. Rockenberger, T. van Buuren, and A. P. Alivisatos, Phys. Rev. Lett. 83, 3474 (1999).


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