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19 Sep 2005

Volume 87, Issue 12, Articles (12xxxx)

Issue Cover Spotlight Figure

Appl. Phys. Lett. 87, 123111 (2005); http://dx.doi.org/10.1063/1.2053370 (3 pages)

Xianghui Zhang, Ye Zhang, Jun Xu, Zhe Wang, Xihong Chen, Dapeng Yu, Peng Zhang, Hanhong Qi, and Yongjun Tian
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Correlation between size-induced lattice variations and yellow emission shift in ZnO nanostructures

Liping Li, Xiaoqing Qiu, and Guangshe Li

Appl. Phys. Lett. 87, 124101 (2005); http://dx.doi.org/10.1063/1.2051800 (3 pages) | Cited 13 times

Online Publication Date: 13 September 2005

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Theoretical studies available in the literature for investigating the quantum size effects in band-gap and luminescence properties have excluded lattice variations that may occur in the nanoscale regime. This work addresses the lattice dimensions of highly crystalline ZnO nanorods as a function of diameter. The corresponding quantum size effects in band modifications were explored using the intrinsic yellow emission as the probe. It was found that with increasing nanorod diameter, the lattice volume decreased linearly, while the peak maximum of the yellow luminescence shifted towards lower energies. This redshift is found to be smaller than that calculated from band-gap theories. These findings have been interpreted in terms of the probable increase in height of the top of valence band induced by the lattice contraction associated with the increase in nanorod diameter.
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78.67.-n Optical properties of low-dimensional, mesoscopic, and nanoscale materials and structures
78.55.Et II-VI semiconductors
61.46.-w Structure of nanoscale materials
71.20.Nr Semiconductor compounds
73.22.-f Electronic structure of nanoscale materials and related systems
61.66.Fn Inorganic compounds
73.21.-b Electron states and collective excitations in multilayers, quantum wells, mesoscopic, and nanoscale systems

Grain size estimations from the direct measurement of nucleation and growth

Hoo-Jeong Lee, Hai Ni, David T. Wu, and Ainissa G. Ramirez

Appl. Phys. Lett. 87, 124102 (2005); http://dx.doi.org/10.1063/1.2053348 (3 pages) | Cited 14 times

Online Publication Date: 13 September 2005

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Microstructures that emerge during the crystallization of amorphous materials depend on nucleation and growth kinetics. The ability to predict these final microstructures, particularly the average grain size, would allow better control of material properties. Well-established crystallization theories have proposed mathematical models to describe these microstructures. What remains missing, however, is an independent experimental verification of the microstructures these models predict. Here, we report in situ transmission-electron-microscopy experimental methods that assess independently the nucleation and growth rates of crystallizing grains. A consequence of having a separate, experimentally-determined description of nucleation and growth is the ability to predict the average grain size over a broad range of temperatures. The results from these experimental methods verify the theoretical models that were posed several decades ago.
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64.70.K- Solid-solid transitions
64.60.Q- Nucleation
61.43.-j Disordered solids

Hard x-ray nanoprobe based on refractive x-ray lenses

C. G. Schroer, O. Kurapova, J. Patommel, P. Boye, J. Feldkamp, B. Lengeler, M. Burghammer, C. Riekel, L. Vincze, A. van der Hart, and M. Küchler

Appl. Phys. Lett. 87, 124103 (2005); http://dx.doi.org/10.1063/1.2053350 (3 pages) | Cited 94 times

Online Publication Date: 13 September 2005

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Based on nanofocusing refractive x-ray lenses a hard x-ray scanning microscope is currently being developed and is being implemented at beamline ID13 of the European Synchrotron Radiation Facility (Grenoble, France). It can be operated in transmission, fluorescence, and diffraction mode. Tomographic scanning allows one to determine the inner structure of a specimen. In this device, a monochromatic (E = 21 keV) hard x-ray nanobeam with a lateral extension of 47×55 nm2 was generated. Further reduction of the beam size to below 20 nm is targeted.
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07.85.-m X- and γ-ray instruments

Electron diffraction from free-standing, metal-coated transmission gratings

Glen Gronniger, Brett Barwick, Herman Batelaan, Tim Savas, Dave Pritchard, and Alex Cronin

Appl. Phys. Lett. 87, 124104 (2005); http://dx.doi.org/10.1063/1.2053347 (3 pages) | Cited 11 times

Online Publication Date: 14 September 2005

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Electron diffraction from a free-standing nanofabricated transmission grating was demonstrated, with energies ranging from 125 eV to 25 keV. Observation of 21 diffraction orders highlights the quality of the gratings. The image charge potential due to one electron was measured by rotating the grating. These gratings may pave the way to low-energy electron interferometry.
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42.79.Dj Gratings
61.05.J- Electron diffraction and scattering

Optimization of ultrafast laser generated low-energy ion beams from silicon targets

R. Stoian, A. Mermillod-Blondin, N. M. Bulgakova, A. Rosenfeld, I. V. Hertel, M. Spyridaki, E. Koudoumas, P. Tzanetakis, and C. Fotakis

Appl. Phys. Lett. 87, 124105 (2005); http://dx.doi.org/10.1063/1.2053355 (3 pages) | Cited 13 times

Online Publication Date: 14 September 2005

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We demonstrate the possibility to manipulate the kinetic properties of ion beams generated by ultrafast laser ablation of silicon. The versatility in regulating the sub-keV ion flux is achieved by implementing adaptive control of the temporal shape of incident laser pulses. Tunable characteristics for the charged beams are obtained using excitation synchronized with the phase-transformation dynamics, exploiting transitions to volatile fluid states with minimal energetic expenses.
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42.65.Re Ultrafast processes; optical pulse generation and pulse compression
61.82.Fk Semiconductors
42.60.Fc Modulation, tuning, and mode locking
61.80.Ba Ultraviolet, visible, and infrared radiation effects (including laser radiation)
78.47.-p Spectroscopy of solid state dynamics
64.70.Hz Solid-vapor transitions

Electric lithography by electrochemical polymerization

W. Shen, Y. Chen, and Q. Pei

Appl. Phys. Lett. 87, 124106 (2005); http://dx.doi.org/10.1063/1.2056585 (3 pages) | Cited 3 times

Online Publication Date: 14 September 2005

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We demonstrate a lithographic technique, electric lithography, in which conductive patterns on a mask are transferred to a substrate by applying an electric field to locally configure a resist layer sandwiched between the patterns and the substrate. Proof-of-concept pattern transfer experiments were carried out through electrochemical polymerization of pyrrole monomers dissolved in an aqueous electrolyte and 2,2′’-bithiophene monomers dissolved in a solid polymer electrolyte. By controlling the intensity and duration of the applied electric field on different mask patterns, we have also demonstrated that the electric lithography can create on-demand three-dimensional patterns in the resist.
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82.35.-x Polymers: properties; reactions; polymerization
82.45.Wx Polymers and organic materials in electrochemistry
82.45.Gj Electrolytes
85.40.Hp Lithography, masks and pattern transfer
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