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Appl. Phys. Lett. 87, 151911 (2005); doi:10.1063/1.2099526 (3 pages)

Electrically induced surface instability of a conductive thin film on a dielectric substrate

Rui Huang

Department of Aerospace Engineering and Engineering Mechanics, University of Texas, Austin, Texas 78712

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(Received 5 July 2005; accepted 8 September 2005; published online 6 October 2005)

The stability of a conductive thin film on a dielectric substrate subjected to a transverse electric field and a residual strain is analyzed. Under a uniform electric field, an equilibrium state exists with a constant thickness reduction of the substrate. The equilibrium state, however, can be unstable, depending on the intensity of the electric field, the stiffness, and Poisson’s ratio of the substrate, and on the residual strain in the film. Based on a linear perturbation analysis, the critical condition is determined, beyond which wrinkling of the film is expected.

© 2005 American Institute of Physics

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KEYWORDS and PACS

PACS

  • 77.84.-s

    Dielectric, piezoelectric, ferroelectric, and antiferroelectric materials

  • 77.55.-g

    Dielectric thin films

  • 68.60.Bs

    Mechanical and acoustical properties

  • 73.61.-r

    Electrical properties of specific thin films

  • 81.40.Jj

    Elasticity and anelasticity, stress-strain relations

  • 62.20.D-

    Elasticity

PUBLICATION DATA

ISSN:

0003-6951 (print)  
1077-3118 (online)

For access to fully linked references, you need to log in.
    M. Watanabe, H. Shirai, and T. Hirai, J. Appl. Phys. 92, 4631 (2002)JAPIAU000092000008004631000001.

    S. P. Lacour, S. Wagner, Z. Y. Huang, and Z. Suo, Appl. Phys. Lett. 82, 2404 (2003)APPLAB000082000015002404000001.

    E. Cerda and L. Mahadevan, Phys. Rev. Lett. 90, 074302 (2003).

    Z. Y. Huang, W. Hong, and Z. Suo, Phys. Rev. E 70, 030601R (2004).

    S. Herminghaus, Phys. Rev. Lett. 83, 2359 (1999).

    Z. Lin, T. Kerle, S. M. Baker, D. A. Hoagland, E. Schaffer, U. Steiner, and T. P. Russell, J. Chem. Phys. 114, 2377 (2001)JCPSA6000114000005002377000001.

    S. Y. Chou, L. Zhang, and L. Guo, Appl. Phys. Lett. 75, 1004 (1999)APPLAB000075000007001004000001.


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